Antireflective Thin Film Design Using ITO Material

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Acta Photonica Sinica >Volume 34 >Issue 8 >Page 1187 > Article

Acta Photonica Sinica
Vol. 34, Issue 8, 1187 (2005)

Antireflective Thin Film Design Using ITO Material

[in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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DOI: Cite this Article

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Antireflective Thin Film Design Using ITO Material[J]. Acta Photonica Sinica, 2005, 34(8): 1187 Copy Citation Text

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References

[1] Qiao Z,Latz R,Mergel D. Thickness dependence of In2O3:Sn film growth.Thin Solid Films,2004,466(1-2):250～258

[2] Antony A A, Nisha M,Manoj R, et al.Influence of target to substrate spacing on the properties of ITO thin films.Applied Surface Science,2004,225:(1-2):294～301

[3] Chopra K L, Major S,Pandya D K. Transparent conductors-A status review.Thin Solid Films,1983,102(1):1～46

[6] Guenther K H. Recent progress in optical coating technology:low voltage ion plating deposition.Proc SPIE, 1990,1270:211～221

[11] Macleod H A.Thin Film Optical Filters, 2nd ed. U.K., Bristol: Adam Hilger LtdAdam Hilger, 1986.35

[12] Wang R.Design of antireflective Coating Using Indium Tin Oxide Film Prepared by Ion Assisted Deposition. 1999 Society of Vacuum Coaters, 42nd Annual Technical Conference Proceedings, Chicago IL, 246～249

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[1] SONG Chun-yan, LIU Xing-yuan. Transparent Conducting Film in Visible Region Based on ZnSe/Ag/ZnSe[J]. Acta Photonica Sinica, 2011, 40(6): 857

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Antireflective Thin Film Design Using ITO Material[J]. Acta Photonica Sinica, 2005, 34(8): 1187

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