The principle of UV nanoimprint lithography (UV-NIL) and the effect of the parallelism between the stamp and substrate on the imprint quality were introduced.Bellows cylinder vacuum UV nanoimprint lithography machine was developed,which could place stamp and substrate parallel to each other through bellows cylinder,and transferred the pressing force to a large area substrate effectively and uniformly.With the design of the optical system,the implementation of UV nano-imprinting lithography and the optical system’s construction and adjustment were analyzed.UV nanoimprint lithography for Polymer OG154 was implemented.Printing results of 100 nm features over a 5cm×5cm area were presented.