Optimization Design of Illumination Uniformity of Relay Lens in Lithography Illumination System

Shuang GONG; Baoxi YANG; Huijie HUANG

doi:10.3788/gzxb20225103.0322001

[1] T MATSUYAMA, Y OHMURA, D M WILLIAMSON. The lithographic lens: its history and evolution. Optical Microlithography XIX, 6154, U124-U137(2006).

[2] Zhifan LIU, Ming CHEN, Yang BU et al. Blade edge's penumbra measurement for scanning slit of lithographic tools. Chinese Journal of Lasers, 46, 1004005(2019).

[3] Weilin CHENG, Fang ZHANG, Dongliang LIN et al. High precision correction method of illumination field uniformity for photolithography illumination system. Acta Optica Sinica, 38, 0722001(2018).

[4] Wei ZHANG, Yan GONG. Design of diffractive optical elements for off-axis illumination in projection lithography. Optics and Precision Engineering, 16, 2081-2086(2008).

[5] G ZOCHLING. Illumination systems analysis-a proposal for computing the local illuminance, 655, 162-168(1986).

[6] M REUSS. The cos4 law of illumination. Journal of the Optical Society of America, 35, 283-288(1945).

[8] Xing ZHONG, Yuan ZHANG, Guang JIN. Illumination uniformity optimization of wide-viewing-field optical system. Acta Optica Sinica, 32, 0322004(2012).

[9] Enshi QU, Hengjin ZHANG, Jianzhong CAO et al. Discussion of illuminance formula in optical design. Acta Optica Sinica, 28, 1364-1368(2008).

[10] Chen CHEN, Chunhai HU, Weishan LI et al. Calculation method of relative illumination of lens image plane. Acta Optica Sinica, 36, 1108001(2016).

[11] Yu GAN, Fang ZHANG, Siyu ZHUslet. Research on evaluation of algorithm of pupil characteristic parameters in lithography illumination system. Chinese Journal of Lasers, 46, 0304007(2019).

[12] Zhonghua HU, Jing ZHU, Baoxi YANG et al. Far-field multi-parameter measurement of diffractive optical element for pupil shaping in lithography system. Chinese Journal of Lasers, 40, 0908001(2013).

[14] Liping GUO, Xiangzhao WANG, Huijie HUANG. Impact of illumination pupil filling unbalance on imaging performance of lithography. Acta Optica Sinica, 26, 885-890(2006).