Shuang GONG, Baoxi YANG, Huijie HUANG. Optimization Design of Illumination Uniformity of Relay Lens in Lithography Illumination System[J]. Acta Photonica Sinica, 2022, 51(3): 0322001
- Acta Photonica Sinica
- Vol. 51, Issue 3, 0322001 (2022)
Fig. 1. Schematic of the optical principle of projection lithography
Fig. 2. Schematic of partial coherent illumination
Fig. 3. Calculation of solid angle of off-axis beam
Fig. 4. Diagram of exit pupil regionalism
Fig. 5. Structure diagram of relay lens set of illumination system
Fig. 6. Relative illumination of conventional illumination of different σ
Fig. 7. Relative illumination of annular illumination of different σ
Fig. 8. Simulation for relay lens set of illumination system
Fig. 9. Simulated relative illumination of conventional illumination of different σ
Fig. 10. Simulated relative illumination of annular illumination of different σ
Fig. 11. Experimental device of illumination uniformity
Fig. 12. Illumination field and normalized integrated illumination profile
Fig. 13. Experimental relative integrated illumination of different σ
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Table 1. Parameters of the Relay Lens
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Table 2. Numerical aperture corresponding to coherence factor under conventional illumination
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Table 3. Numerical aperture corresponding to coherence factor under annular illumination
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Table 4. Illumination uniformity of convention illumination and annular illumination under different coherence factors
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Table 5. Simulated illumination uniformity of convention illumination and annular illumination under different coherence factors
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Table 6. Experimental illumination uniformity of convention illumination and annular illumination
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