• Opto-Electronic Engineering
  • Vol. 46, Issue 4, 18022010 (2019)
Kong Mingdong1、2、*, Li Bincheng3, Guo Chun1, Liu Chunding1, and He Wenyan1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    DOI: 10.12086/oee.2019.18022010 Cite this Article
    Kong Mingdong, Li Bincheng, Guo Chun, Liu Chunding, He Wenyan. Characterictics of absorption edge of SiO2 films[J]. Opto-Electronic Engineering, 2019, 46(4): 18022010 Copy Citation Text show less
    References

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    Kong Mingdong, Li Bincheng, Guo Chun, Liu Chunding, He Wenyan. Characterictics of absorption edge of SiO2 films[J]. Opto-Electronic Engineering, 2019, 46(4): 18022010
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