• Chinese Optics Letters
  • Vol. 13, Issue 2, 020502 (2015)
Yunlin Chen*, Tianwei Fan, and Man Tong
Author Affiliations
  • Institute of Applied Micro-Nano Materials, School of Science, Beijing Jiaotong University, Beijing 100044, China
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    DOI: 10.3788/COL201513.020502 Cite this Article Set citation alerts
    Yunlin Chen, Tianwei Fan, Man Tong. Diffractive self-imaging based on selective etching of a ferroelectric domain inversion grating[J]. Chinese Optics Letters, 2015, 13(2): 020502 Copy Citation Text show less

    Abstract

    A hexagonal array grating based on selective etching of a 2D ferroelectric domain inversion in a periodically poled MgO-doped LiNbO3 crystal is fabricated. The effects to the diffractive self-imaging as a function of diffraction distance for a fixed phase difference and array duty cycle of the grating is theoretically analyzed. The Talbot diffractive self-imaging properties after selective etching of a 2D ferroelectric domain inversion grating under a fixed phase difference are experimentally demonstrated. A good agreement between theoretical and experimental results is observed.
    u(x,y)=mnAmnexp[i2π(mxtx+ny3tx)],(1)

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    A00=exp[i(Δφ)]+c{exp[i(Δφ)]exp[i(Δφ)]},(2)

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    Amn=i{1+exp[iπ(n+m)]}×(1)nsin(Δφ)n(n2m2)π2×[(n+m)cos(2m3n5π)2ncos(nπ5)+(nm)cos(2m+3n5)π].(3)

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    uz(Δφ,x,y)=mnAmn×exp[i2π(mxtx+ny3tx)]×exp[iπλz(3m2+n23tx2)].(4)

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    uz(Δφ,x,y)=mnAmn×exp[i2πDl(mx+ny3)]×exp[iπβ2(3m2+n2)].(5)

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    Yunlin Chen, Tianwei Fan, Man Tong. Diffractive self-imaging based on selective etching of a ferroelectric domain inversion grating[J]. Chinese Optics Letters, 2015, 13(2): 020502
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