• Chinese Optics Letters
  • Vol. 10, Issue s2, S21403 (2012)
Pingping Zhang, Yan Ma, and Tongbao Li
DOI: 10.3788/col201210.s21403 Cite this Article Set citation alerts
Pingping Zhang, Yan Ma, Tongbao Li. Feature width miniaturization in atom nanolithography with double standing wave layers[J]. Chinese Optics Letters, 2012, 10(s2): S21403 Copy Citation Text show less
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Pingping Zhang, Yan Ma, Tongbao Li. Feature width miniaturization in atom nanolithography with double standing wave layers[J]. Chinese Optics Letters, 2012, 10(s2): S21403
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