• Chinese Optics Letters
  • Vol. 10, Issue s2, S21403 (2012)
Pingping Zhang, Yan Ma, and Tongbao Li
DOI: 10.3788/col201210.s21403 Cite this Article Set citation alerts
Pingping Zhang, Yan Ma, Tongbao Li. Feature width miniaturization in atom nanolithography with double standing wave layers[J]. Chinese Optics Letters, 2012, 10(s2): S21403 Copy Citation Text show less

Abstract

Periodic nanostructures spaced by half of the wavelength can be obtained by the technology of laser-focused atomic deposition. Experimental result with single standing wave layer is presented, with a periodicity of 213 ± 0.1 nm, a height of 4 nm, and a feature width of 64 +-6 nm. To further minimize the feature width,focusing and depositing characteristics of double standing wave layers are numerically simulated with optimized particle optics model. It is shown that the spherical aberration is reduced significantly. The predicted feature width is 18.2 nm and the height is approximately 12.6 nm when the powers of the two standing wave layers are 6 and 14 mW, respectively. Well-defined line occurs even when the full-width at half-maximum (FWHM) of transverse angular spread reaches 0.5 mrad.
Pingping Zhang, Yan Ma, Tongbao Li. Feature width miniaturization in atom nanolithography with double standing wave layers[J]. Chinese Optics Letters, 2012, 10(s2): S21403
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