Fine Correction of Optical Proximity Effect by Using Gray-Tone Coding Mask

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Acta Optica Sinica >Volume 20 >Issue 4 >Page 518 > Article

Acta Optica Sinica
Vol. 20, Issue 4, 518 (2000)

Fine Correction of Optical Proximity Effect by Using Gray-Tone Coding Mask

[in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]¹, [in Chinese]², [in Chinese]³, and [in Chinese]⁴

Author Affiliations

¹[in Chinese]

²[in Chinese]

³Central Microstructure Facility, Rutherford Appleton Laboratory, Chilton, Didcot, OX11 0QX, UK

⁴[in Chinese]

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Fine Correction of Optical Proximity Effect by Using Gray-Tone Coding Mask[J]. Acta Optica Sinica, 2000, 20(4): 518 Copy Citation Text

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Abstract

A new method has been proposed to realize fine optical proximity correction (OPC) with gray-tone coding mask instead of gray-tone mask. The advantages of the new method are analyzed. The coding rules of the gray-tone coding mask and the relationships between the gray-tone coding mask and gray-tone mask have been discussed. OPC simulation results are given with the gray-tone coding mask and the synthesis area deviation of aerial image drops 10% after OPC.

Keywords

gray-tone coding mask OPC photolithography.

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