The design and fabrication of high aspect-ratio hard X-ray zone plates by X-ray lithography are studied. The X-ray lithography mask was fabricated by electron beam lithography, and the final hard X-ray zone plates were fabricated by X-ray lithography. By integrating supporting points into the photoresist structure, the high aspect ratio of hard X-ray zone plates fabricated by X-ray lithography was greatly increased. The arrangement strategy of added supporting points was optimized to reduce the area ratio taken by the supporting points. High quality zone plates were achieved with an outermost zone width of 200 nm and a thickness of 2.8 μm. The fabricated zone plates can be used for 10 to 25 keV hard X-rays, and imaging resolution better than 250 nm can be expected.