• Chinese Optics Letters
  • Vol. 6, Issue 3, 03225 (2008)
Yanming Shen1、2, Zhaoxia Han, Jianda Shao1, Shuying Shao1, and Hongbo He1
Author Affiliations
  • 1Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800
  • 2Graduate University of Chinese Academy of Sciences, Beijing 1000493 School of Science, Henan University of Science and Technology, Luoyang 471003
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    Yanming Shen, Zhaoxia Han, Jianda Shao, Shuying Shao, Hongbo He. Annealing effects on residual stress of HfO2/SiO2 multilayers[J]. Chinese Optics Letters, 2008, 6(3): 03225 Copy Citation Text show less
    References

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    [2] Y. Zhao, T. Wang, D. Zhang, J. Shao, and Z. Fan, Appl. Surf. Sci. 245, 335(2005).

    [3] S. Shao, J. Shao, H. He, and Z. Fan, Opt. Lett. 30, 2119 (2006).

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    [5] S. Shao, G. Tian, Z. Fan, and J. Shao, Acta Opt. Sin. (in Chinese) 25, 126 (2005).

    [6] S. Tamuleviccius, Vacuum 51, 127 (1998).

    [7] Y. Shen, H. He, S. Shao, J. Shao, and Z. Fan, High Power Laser and Particle Beams (in Chinese) 17, 1812 (2005).

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    [13] S. Shao, Z. Fan, J. Shao, and H. He, Thin Solid Films 445, 59 (2003).

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    Yanming Shen, Zhaoxia Han, Jianda Shao, Shuying Shao, Hongbo He. Annealing effects on residual stress of HfO2/SiO2 multilayers[J]. Chinese Optics Letters, 2008, 6(3): 03225
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