Annealing effects on residual stress of HfO2/SiO2 multilayers

Yanming Shen; Zhaoxia Han; Jianda Shao; Shuying Shao; Hongbo He

Journals >Chinese Optics Letters >Volume 6 >Issue 3 >Page 03225 > Article

Chinese Optics Letters
Vol. 6, Issue 3, 03225 (2008)

Annealing effects on residual stress of HfO2/SiO2 multilayers

Yanming Shen^1、2, Zhaoxia Han, Jianda Shao¹, Shuying Shao¹, and Hongbo He¹

Author Affiliations

¹Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800

²Graduate University of Chinese Academy of Sciences, Beijing 1000493 School of Science, Henan University of Science and Technology, Luoyang 471003

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Yanming Shen, Zhaoxia Han, Jianda Shao, Shuying Shao, Hongbo He. Annealing effects on residual stress of HfO2/SiO2 multilayers[J]. Chinese Optics Letters, 2008, 6(3): 03225 Copy Citation Text

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Yanming Shen, Zhaoxia Han, Jianda Shao, Shuying Shao, Hongbo He. Annealing effects on residual stress of HfO2/SiO2 multilayers[J]. Chinese Optics Letters, 2008, 6(3): 03225

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