Author Affiliations
1School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China2Beijing Institute of Spacecraft Environment Engineering, Beijing 100094, China3National Key Laboratory of Science and Technology on Reliability and Environment Engineering, Beijing 100094, China4Department of Precision Instrument, Tsinghua University, Beijing 100091, Chinashow less
Fig. 1. Schematic of three-order slitless imaging spectrometer. (a) Optical layout of MOSES; (b) solar images with three diffraction orders by single snapshot
Fig. 2. Schematic of three-order slitless imaging spectrometer with new optical layout
Fig. 3. Ray-tracing model for three-order slitless imaging spectrometer
Fig. 4. Geometric optics model for off-axis hyperbolic mirror
Fig. 5. Schematic of aberration-corrected EVLS grating
Fig. 6. Sun flare spectrum from SDO/EVE
Fig. 7. Optical layout of solar EUV slitless imaging spectrometer. (a) 2D optical layout; (b) 3D model diagram
Fig. 8. Ruling density distribution of EVLS grating
Fig. 9. Curve of aberration term of astigmatisms. (a) Tangential astigmatism for -1 order; (b) tangential astigmatism for +1 order; (c) sagittal astigmatism for -1 order; (d) sagittal astigmatism for +1 order
Fig. 10. Curve of aberration term of coma. (a) Coma for -1 order; (b) coma for +1 order
Fig. 11. Maximum grid distortion change with wavelength under marginal FOV. (a) -1 order; (b) +1 order
Fig. 12. Variation of RMS radius of spot for -1 order. (a) RMS radius of spot versus wavelength in the different off-axis FOVs; (b) RMS radius of spot versus FOV in the different wavelength
Fig. 13. Variation of RMS radius of spot for +1 order. (a) RMS radius of spot versus wavelength in the different off-axis FOVs; (b) RMS radius of spot versus FOV in the different wavelength
Fig. 14. Spot diagrams in 0 order imaging plane under the different FOVs and RMS radius of spot versus FOV for 0 order. (a) Spot diagrams in 0 order imaging plane under the different FOVs; (b) RMS radius of spot versus FOV for 0 order
Fig. 15. MTFs of design system under different diffraction orders. (a) -1 order; (b) +1 order; (c) 0 order
Fig. 16. Diffraction enclosed energy to evaluate system’s spatial resolution. (a) -1 order; (b) +1 order; (c) 0 order
Fig. 17. Spectral resolution simulation verification for ±1 diffraction orders. (a)(b) -1 order; (c)(d) +1 order
Fig. 18. Transmission of Si filter with 0.1 μm thickness
Fig. 19. Reflectance versus wavelength for SiC/Mg multilayer
Fig. 20. Efficiency versus wavelength for EVLS grating
Fig. 21. Effective area of slitless imaging spectrometer versus wavelength
Instrument | Wavelength /nm | 2D FOV /(arcmin×arcmin) | Spatialresolution /arcsec | Spectralresolution /(10-4 nm) | Primarymirror | Secondarymirror | Length /mm |
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MOSES-06 | 29.4--31.4 | 10×20 | 0.6 | 30 | SULS grating | Fold flat | 2400 | Our design | 29.4--31.4 | 20×20 | 0.6 | 35 | Hyperbola | EVLS grating | 910 |
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Table 1. Specifications of the solar EUV slitless imaging spectrometer
Term | Aberration |
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F10 and F01 | Basic grating equation | F20 | Tangential astigmatism | F02 | Sagittal astigmatism | F11 | Off-axis defocusing | F30 and F21 | Coma | F12 | Field curvature | F40, F22 and F04 | Spherical aberration |
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Table 2. Fjk terms with their associate aberrations
Specification |
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Spectral range /nm | 29.4--31.4 | FOV /(arcmin×arcmin) | 20×20 | Spectral resolution /(10-4 nm) | 35 | Spatial resolution /arcsec | 0.6 (440 km) | Line-of-sight velocity /(km·s-1) | >34.5 | High cadence /s | <10 | System focal length /mm | 4500 | Pixel size of detectors /μm | 13 (2048×2048) | Envelope size of optical system /(mm×mm×mm) | 910×310×60 | Telescope design | RT /mm | 1520 | Conic | -1.307 | Δ /mm | 80 | Spectral imaging system design | Field stop size /(mm×mm) | 4.5×4.5 | /mm-1 | 3600 | m | +1 order, 0 order, and -1 order | Grating parameter | Initial | Optimum | rA /mm | 150 | 150 | β | 6× | 5.905× | i /(°) | 5.13 | 5.4 | a /mm | 360.000 | 352.906 | b /mm | 305.010 | 300.957 | c /mm | 302.425 | 300.034 | ζ2 | -0.04448 | -0.04736 | ζ3 | -0.006852 | -0.007201 | Ruling area /(mm×mm) | 25×25 | Three independent detectors design | Order | Wavelength /nm | Tilt angle of detectors /(°) | -1 order | 29.4--31.4 | 14.66 | 0 order | 29.4--31.4 | 27.95 | +1 order | 29.4--31.4 | 32.71 |
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Table 3. Specifications and optical element parameters for slitless imaging spectrometer
γ /(°) | d / nm | τ | N | δSiC-Mg /nm | δMg-SiC /nm |
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84.6 | 15.27 | 0.22 | 40 | 2.0 | 1.0 |
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Table 4. Periodic SiC/Mg multilayer parameters