Determination of Optical Constants of LaF3 Films from Spectrophotometric Measurements

Guo Chun; Lin Dawei; Zhang Yundong; Li Bincheng

doi:10.3788/aos201131.0731001

[1] D. P. Arndt, R. M. A. Azzam, J. M. Bennett et al.. Multiple determination of the optical constants of thin-film coating materials［J］. Appl. Opt., 1984, 23(20): 3571～3596

[2] Xue Chunrong, Yi Kui, Wei Chaoyang et al.. Optical constants of DUV/UV fluoride thin films［J］. Chin. Opt. Lett., 2009, 7(5): 449～451

[3] Xue Chunrong, Yi Kui, Qi Hongji et al.. Optical constants of film materials for deep ultraviolet/ultraviolet ［J］. Chinese J. Lasers, 2009, 36(8): 2135～2139

[4] Zhou Yi, Wang Aiying. Determination of optical constants and thickness of diamond-like carbon films by a multiple sample method［J］. Acta Optica Sinica, 2010, 30(8): 2468～2473

[5] S. Y. Kim. Simultaneous determination of refractive index, extinction coefficient, and void distribution of titanium dioxide thin film by optical methods［J］. Appl. Opt., 1996, 35(34): 6703～6707

[6] J. L. Cardin, D. Leduc. Determination of refractive index, thickness,and the optical losses of thin films from prism-film coupling measurements［J］. Appl. Opt., 2008, 47(7): 894～900

[7] Y. J. Jen, C. H. Hsieh, T. S. Lo. Optical constant determination of an anisotropic thin film via surface plasmon resonance:analyzed by sensitivity calculation［J］. Opt. Commun., 2005, 244(1-6): 269～277

[8] Y. J. Jen, C. Y. Peng, H. H. Chang. Optical constant determination of an anisotropic thin film via polarization conversion［J］. Opt. Express, 2007, 15(8): 4445～4451

[9] H. Blaschke, J. Kohlhaas, P. Kadkhoda et al.. DUV/VUV spectrophotometry for high precision spectral characterization［C］. SPIE, 2003, 4932: 536～543

[10] A. Tikhonravov, M. Trubetskov, T. Amotchkina et al.. Reliable determination of wavelength dependence of thin films refractive index［C］. SPIE, 2003, 5188: 331～342

[11] S. Humphrey. Direct calculation of the optical constants for a thin film using a midpoint envelope［J］. Appl. Opt., 2007, 46(21): 4660～4666

[12] M. F. Al-Kuhaili, E. E. Khawaja, S. M. A. Durrani. Determination of the optical constants (n and k) of inhomogeneous thin films with linear index profiles［J］. Appl. Opt., 2006, 45(19): 4591～4597

[13] H. Niederwald, L. Deisenroth, S. Nunnendorf. Off axis microspectrophotometer for optical coating characterization on complex surfaces［C］. SPIE, 2005, 5965: 59651S

[14] A. H. Macleod. Thin-Film Opitcal Filters［M］. London: Institute of Physics Publishing, 2001. 37～40

[15] M. Bischoff, D. Gbler, N. Kaiser et al.. Optical and structural properties of LaF3 thin films［J］. Appl. Opt., 2008, 47(13): C157～C161

[16] C. C. Lee, M. C. Liu, M. Kaneko et al.. Influence of thermal annealing and ultraviolet light irradiation on LaF3 thin films at 193 nm［J］. Appl. Opt., 2005, 44(32): 6921～6926

[17] Y. Taki, K. Muramatsu. Hetero-epitaxial growth and optical properties of LaF3 on CaF2［J］. Thin Solid Films, 2002, 420-421: 30～37

[18] P. Kelkar, B. Tirri, R. Wilklow et al.. Deposition and characterization of challenging DUV coatings［C］. SPIE, 2008, 7067: 706708

[19] Li Bincheng, Lin Dawei, Han Yanling et al.. Antireflective fluoride coatings for widely tunable deep-ultraviolet diode-pumped solid-state laser applications［J］. Chin. Phys. Lett., 2010, 27(4): 044201

[20] E. D. Palik. Handbook of Optical Constants of Solids II［M］. Boston:Academic Press, 1998. 830～831

[21] P. Marchand, L. Marmet. Binomial smoothing filter:a way to avoid some pitfalls of least-squares polynomial smoothing［J］. Rev. Sci. Instrum., 1983, 54(8): 1034～1041

[22] D. Minkov, R. Swanepoel. Computerization of the optical characterization of a thin dielectric film［J］. Opt. Engng., 1993, 32(12): 3333～3337

[23] M. C. Liu, C. C. Lee, M. Kaneko et al.. Microstructure related properties of lanthanum fluoride films deposited by molybdenum boat evaporation at 193 nm［J］. Thin Solid Films, 2005, 492(1-2): 45～51

[24] H. Uhlig, R. Thielsch, J. Heber et al.. Lanthanide tri-fluorides: a survey of the optical, mechanical and structural properties of thin films with emphasis of their use in the DUV-VUV-spectral range［C］. SPIE, 2005, 5963: 59630N

[25] D. Ristau, S. Günster, S. Bosch et al.. Ultraviolet optical and microstructural properties of MgF2 and LaF3 coatings deposited by ion-beam sputtering and boat and electron-beam evaporation［J］. Appl. Opt., 2002, 41(16): 3196～3204

[26] R. Gtzelmann, D. H. Hagedorn, A. Zller et al.. Oxide and fluoride coatings for the excimer wavelength 193 nm［C］. SPIE, 2005, 5963: 59630L

CLP Journals