A novel laser shock post-processing technique on the laser-induced damage resistance of 1ω HfO2/SiO2 multilayer coatings

Tangyang Pu; Wenwen Liu; Yueliang Wang; Xiaoming Pan; Leiqing Chen; Xiaofeng Liu

doi:10.1017/hpl.2021.4

Journals >High Power Laser Science and Engineering >Volume 9 >Issue 2 >Page 02000e19 > Article

High Power Laser Science and Engineering
Vol. 9, Issue 2, 02000e19 (2021)

A novel laser shock post-processing technique on the laser-induced damage resistance of 1ω HfO₂/SiO₂ multilayer coatings

Tangyang Pu¹, Wenwen Liu^1、*, Yueliang Wang², Xiaoming Pan¹, Leiqing Chen¹, and Xiaofeng Liu³

Author Affiliations

¹College of Mechanical and Electrical Engineering, Wenzhou University, Wenzhou325035, China

²National Engineering Laboratory for Modern Materials Surface Engineering Technology, Institute of New Materials, Guangdong Academy of Sciences, Guangzhou510651, China

³Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Shanghai201800, China

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DOI: 10.1017/hpl.2021.4 Cite this Article Set citation alerts

Tangyang Pu, Wenwen Liu, Yueliang Wang, Xiaoming Pan, Leiqing Chen, Xiaofeng Liu. A novel laser shock post-processing technique on the laser-induced damage resistance of 1ω HfO₂/SiO₂ multilayer coatings[J]. High Power Laser Science and Engineering, 2021, 9(2): 02000e19 Copy Citation Text

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