• Acta Optica Sinica
  • Vol. 33, Issue s1, 114003 (2013)
Lu Guoguang*, Lei Zhifeng, Huang Yun, and En Yunfei
Author Affiliations
  • [in Chinese]
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    DOI: 10.3788/aos201333.s114003 Cite this Article Set citation alerts
    Lu Guoguang, Lei Zhifeng, Huang Yun, En Yunfei. Lifetime Test of 808 nm High Power Laser Diodes[J]. Acta Optica Sinica, 2013, 33(s1): 114003 Copy Citation Text show less

    Abstract

    In order to obtain the lifetime index of the single-bar 808 nm high power semicondutor laser, an on-line monitoring system under ten workspaces is set up. Subsequent lifetime tests are completed. The conditions of these tests are 25 ℃,100 A, 50 ℃,100 A and 50 ℃, 115 A, respectively. According to the linear regression analysis, the method of least squares, goodness-of-fit test and other statistical knowledge, the power degradation model is obtained. Based on this degradation model the extrapolated lifetime of cm-bars at 25 ℃ is 2.86×109 shots. This lifetime extrapolative method based on the parameter degradation model has some advantages such as short experiment time and high veracity than other traditional accelerated aging test methods.
    Lu Guoguang, Lei Zhifeng, Huang Yun, En Yunfei. Lifetime Test of 808 nm High Power Laser Diodes[J]. Acta Optica Sinica, 2013, 33(s1): 114003
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