APolarization control and measurement technology using a biplate

LI Ya-Hong; FU Yue-Gang; HE Wen-Jun; LIU Zhi-Ying

doi:10.11972/j.issn.1001-9014.2017.04.009

Journals >Journal of Infrared and Millimeter Waves >Volume 36 >Issue 4 >Page 425 > Article

Journal of Infrared and Millimeter Waves
Vol. 36, Issue 4, 425 (2017)

APolarization control and measurement technology using a biplate

LI Ya-Hong^*, FU Yue-Gang, HE Wen-Jun, and LIU Zhi-Ying

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[in Chinese]

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DOI: 10.11972/j.issn.1001-9014.2017.04.009 Cite this Article

LI Ya-Hong, FU Yue-Gang, HE Wen-Jun, LIU Zhi-Ying. APolarization control and measurement technology using a biplate[J]. Journal of Infrared and Millimeter Waves, 2017, 36(4): 425 Copy Citation Text

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References

[1] Goldstein D. Polarized light, revised and expanded［M］. Florida: Lasers Optics & Photonics.2003.

[2] Bashara N M. Ellipsometry and polarized light［M］. America and Canada: Elsevier North-Holland, 1977.

[5] Gil J J. Polarimetric characterization of light and media［J］. European Physical Journal-Applied Physics, 2007, 40(1):1-47.

[6] He W, Fu Y, Yang Z, et al. Polarization properties of a corner-cube retroreflector with three-dimensional polarization ray-tracing calculus ［J］. Applied Optics, 2013, 52(19):4527-4535.

[10] Adam K, Maurer W. Polarization effects in immersion lithography［J］.Journal of Microlithography Microfabrication & Microsystems, 2005, 4(3):329-343.

[11] Mcintyre G R, Kye J W, Levinson H J, et al. Polarization aberrations in hyper-numerical-aperture projection printing: a comparison of various representations［J］. Journal of Microlithography Microfabrication & Microsystems, 2006, 5(3):170-173.

LI Ya-Hong, FU Yue-Gang, HE Wen-Jun, LIU Zhi-Ying. APolarization control and measurement technology using a biplate[J]. Journal of Infrared and Millimeter Waves, 2017, 36(4): 425

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