• Photonics Research
  • Vol. 12, Issue 8, 1776 (2024)
Hao Su1, Jiawen Qiu1, Junlong Li1, Rong Chen2..., Jianbi Le2, Xiaoyang Lei3, Yongai Zhang1,2,4, Xiongtu Zhou1,2,5, Tailiang Guo1,2 and Chaoxing Wu1,2,*|Show fewer author(s)
Author Affiliations
  • 1School of Physics and Information Engineering, Fuzhou University, Fuzhou 350000, China
  • 2Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou 350108, China
  • 3Fujian Inspection and Research Institute for Product Quality, Fuzhou 350002, China
  • 4e-mail: yongaizhang@fzu.edu.cn
  • 5e-mail: xtzhou@fzu.edu.cn
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    DOI: 10.1364/PRJ.522697 Cite this Article Set citation alerts
    Hao Su, Jiawen Qiu, Junlong Li, Rong Chen, Jianbi Le, Xiaoyang Lei, Yongai Zhang, Xiongtu Zhou, Tailiang Guo, Chaoxing Wu, "Non-destructive electroluminescence inspection for LED epitaxial wafers based on soft single-contact operation," Photonics Res. 12, 1776 (2024) Copy Citation Text show less
    (a) Schematic diagram of SC-EL inspection system. (b) Picture of the SC-EL inspection system. (c) Schematic diagram showing the carriers transport and the generation of radiative recombination. (d) Schematic diagram showing the accumulation of carriers and the depletion region. (e) Schematic diagram showing the pre-accumulated carriers dissipating through the circuit. (f) Schematic diagram showing the reverse accumulation of carriers.
    Fig. 1. (a) Schematic diagram of SC-EL inspection system. (b) Picture of the SC-EL inspection system. (c) Schematic diagram showing the carriers transport and the generation of radiative recombination. (d) Schematic diagram showing the accumulation of carriers and the depletion region. (e) Schematic diagram showing the pre-accumulated carriers dissipating through the circuit. (f) Schematic diagram showing the reverse accumulation of carriers.
    Distribution of electron and hole concentrations in one voltage cycle. (a) At 0 μs, 1.25 μs, 2.5 μs, respectively. (b) At 3.75 μs, 5 μs, respectively. (c) At 6.25 μs, 7.5 μs, 8.75 μs, respectively.
    Fig. 2. Distribution of electron and hole concentrations in one voltage cycle. (a) At 0 μs, 1.25 μs, 2.5 μs, respectively. (b) At 3.75 μs, 5 μs, respectively. (c) At 6.25 μs, 7.5 μs, 8.75 μs, respectively.
    Equivalent electrical circuit of the SC-EL system.
    Fig. 3. Equivalent electrical circuit of the SC-EL system.
    (a) Typical PWL obtained by using the SC-EL inspection. (b) Typical measured AC current by using the SC-EL inspection. (c) Microscopy image of LED epitaxial wafer surface after conventional EL inspection. (d) Microscopy image of LED epitaxial wafer surface after SC-EL inspection.
    Fig. 4. (a) Typical PWL obtained by using the SC-EL inspection. (b) Typical measured AC current by using the SC-EL inspection. (c) Microscopy image of LED epitaxial wafer surface after conventional EL inspection. (d) Microscopy image of LED epitaxial wafer surface after SC-EL inspection.
    (a) PWL mapping and physical diagram of SC-EL inspection. (b) PWL mapping and physical diagram of PL inspection. (c) PWL mapping and physical diagram of conventional EL inspection. (d) PWL error of SC-EL inspection. (e) PWL error of PL inspection.
    Fig. 5. (a) PWL mapping and physical diagram of SC-EL inspection. (b) PWL mapping and physical diagram of PL inspection. (c) PWL mapping and physical diagram of conventional EL inspection. (d) PWL error of SC-EL inspection. (e) PWL error of PL inspection.
    (a) Luminescence of MQW inside LED epitaxial wafer during electroluminescence. (b) Luminescence of MQW inside LED epitaxial wafer during photoluminescence.
    Fig. 6. (a) Luminescence of MQW inside LED epitaxial wafer during electroluminescence. (b) Luminescence of MQW inside LED epitaxial wafer during photoluminescence.
    (a) Waveform of the applied AC voltage (top panel) for SC-EL inspection and the measured currents of different LED epitaxial wafer regions. (b) DC I-V curves of the corresponding LED epitaxial wafer regions.
    Fig. 7. (a) Waveform of the applied AC voltage (top panel) for SC-EL inspection and the measured currents of different LED epitaxial wafer regions. (b) DC I-V curves of the corresponding LED epitaxial wafer regions.
    Comparison of existing inspection methods.
    Fig. 8. Comparison of existing inspection methods.
    ReferenceECOCNon-destructiveSystem SimplicityIsEfficiencyAccuracy
    Ref. [11,32,33]YesYesNoMYesLH
    Ref. [34]YesYesNoMYesMH
    Ref. [35]NoYesNoMYesMH
    Ref. [36]NoYesYesHNoHM
    Ref. [37]NoYesYesHNoHM
    This workYesYesYesHYesHH
    Table 1. Comparison of Existing Inspection Methodsa
    Hao Su, Jiawen Qiu, Junlong Li, Rong Chen, Jianbi Le, Xiaoyang Lei, Yongai Zhang, Xiongtu Zhou, Tailiang Guo, Chaoxing Wu, "Non-destructive electroluminescence inspection for LED epitaxial wafers based on soft single-contact operation," Photonics Res. 12, 1776 (2024)
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