• Opto-Electronic Engineering
  • Vol. 32, Issue 10, 1 (2005)
[in Chinese]1、2, [in Chinese]2, [in Chinese]1, and [in Chinese]1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less
    DOI: Cite this Article
    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study of DLC films residual stress by unbalanced magnetron sputtering technology[J]. Opto-Electronic Engineering, 2005, 32(10): 1 Copy Citation Text show less
    References

    [1] P. MAIER-KOMOR. A Simple technique of producing thin carbon films[J]. Nuclear Instruments and Methods,1972,102(3):485-486.

    [2] R.GRIGOROVICI,A.DEVENYI,A.GHEORGHIU,et al. Properties of amorphous carbon films[J]. Journal of Non- Crystalline Solids,1972,8-10:793-797.

    [3] Sol AISENBERG,Ronald CHABOT. Ion- beam deposition of thin films of diamond-like carbon [J]. J. Appl. Phys,1971,42(7):2953-2958.

    [4] A. Ya VINOGRADOV,A. S. ABRAMOV,K. E. ORLOV,et al. Low-temperature plasma-enhanced chemical vapor deposition of hard carbon films [J]. Vacuum,2004,73(1):131-135.

    [5] D. KAWASAKI,D. TSUCHIMURA,W. CHOI,et al. Scanning probe field emission current measurements on diamond-like carbon films treated by reactive ion etching [J]. Journal of Physics:Condensed Matter,2004,16(2):S301-S308.

    [6] S. CHOWDHURY,M. T. LAUGIER,I. Z. RAHMAN. Effects of substrate temperature on bonding structure and mechanical properties of amorphous carbon films [J]. Thin Solid Films,2004,447-448:174-180.

    [7] D. R. MCKENZIE,Y. YIN,N. A. MARKS,et al. Tetrahedral amorphous carbon properties and applications[J]. Journal of Non- crystalline Solids,1993,164-166(2):1101-1106.

    [9] M. BASU,J. DUTTA,S. CHAUDHURI,et al. Determination of stress of DLC films from below band gap optical absorption measurements[J]. Vacuum,1996,47(3):233-238.

    [10] M. K. PUCHERT,P. Y. TIMBRELL,R. N. LAMB. Thickness-dependent stress in sputtered carbon films[J]. J.Vac.Sci.Technol. A,1994,12(3):727-732.

    [11] C. A. DAVIS,D. R. MCKENZIE,Y. YIN,et al. Substitutional nitrogen doping of tetrahedral amorphous carbon[J]. Philosophical Magazine B,1994,69(6):1133-1140.

    [12] F. SPANEPEN. Interfaces and stresses in thin films[J]. Acta mater,2000,48(1):31-42.

    [13] S. G. MALHITRA,Z. U. REK,S. M. YALISOVE,et al. Analysis of thin film stress measurement techniques[J]. Thin Solid Films,1997,301(1-2):45-54.

    [14] Marie-Paule DELPLANCKE-OGLETREE,Othon R. MONTEIRO. In situ measurement of stresses of in diamond-like carbon films [J]. Diamond and Related materials,2003,12(12):2119-2127.

    [15] Craig A. TALOR,Mark F. WAYNE,Wilson K. S. CHIU. Residual stress measurement in thin carbon films by Raman spectroscopy and nanoindentation[J]. Thin Solid Films,2003,429(1-2):190-200.

    [17] C. A. DAVIS. A simple model for the formation of compressive stress in thin films by ion bombardment[J]. Thin Solid Films, 1993,226(1):30-34.

    CLP Journals

    [1] Zhong Hongjun, Yang Mengfei, Lu Xin. Calibration Method of Star Sensor[J]. Acta Optica Sinica, 2010, 30(5): 1343

    [2] GUAN Xu-jun, RUI Guo-sheng, ZHANG Yu-ling, ZHOU Xu. Multi-sensor Order Statistics Unscented Probabilistic Data Association Algorithm[J]. Opto-Electronic Engineering, 2009, 36(8): 16

    [3] Sun Gaofei, Zhang Guoyu, Jiang Huilin, Yang Mengfei, Wang Dayi, Hao Yuncai. Design of Static Star Simulator and Proposes A Technique of Correction Method for the Position of Star[J]. Laser & Optoelectronics Progress, 2011, 48(9): 91201

    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study of DLC films residual stress by unbalanced magnetron sputtering technology[J]. Opto-Electronic Engineering, 2005, 32(10): 1
    Download Citation