Nanoscale Focusing and Leveling Measurement Technology Based on Optical Spatial Split

Sun Yuwen; Li Shiguang; Zong Mingcheng

doi:10.3788/aos201636.0512002

[1] Yao Hanming, Hu Song, Xing Tingwen. Optical projection lithography for micro and nano-fabrication[M]. Beijing: Beijing University of Technology Press, 2006: 61-62.

[2] Paolo Alagna, Omar Zurita, Vadim Timoshkov, et al.. Optimum ArFi light source bandwidth for 10 nm node logic imaging performance[C]. SPIE, 2015, 9426: 942609.

[3] Igor Bouchoms, Martijn Leenders, Jan Jaap Kuit, et al.. Extending 1.35 NA immersion lithography down to 1x nm production nodes[C]. SPIE, 2012, 8326: 83260L.

[4] Zeng Aijun, Wang Xiangzhao, Xu Deyan. Progress in focus and level sensor for projection lithography system[J]. Laser & Optoelectronics Progress, 2004, 41(7): 24-30.

[5] Shu Huer Hou, Edgar Huang, Aroma Tseng, et al.. Improvement of the common DoF across field for hole-structure process layers[C]. SPIE, 2008, 6924: 692434.

[6] Bernhard Liegl, Allen Gabor, Golin Brodsky, et al.. Measuring layer-specific depth-of-focus requirement[C]. SPIE, 2008, 6924: 69244J.

[7] Yasuhiro Hidaka, Kiyoshi Uchikawa, Daniel G Smith. Error analysis and compensation method of focus detection in exposure apparatus[J]. J Opc Soc Am A, 2009, 26(1): 10-18.

[8] Takenobu Kobayashi, Yuji Kosugi. Surface position measuring method and apparatus: US, 7668343 B2[P]. 2010-02-23.

[9] Theodorus Marinus Modderman, Gerrit Johannes Nijmeijer, Johannes Christiaan Maria Jasper. Off-axisleveling in lithographic projection apparatus: US, 7206058B2[P]. 2007-04-17.

[10] Arie Jeffrey Den Boef, Jozef Petrus Henricus Benschop, Ralph Brinkhof, et al.. Level sensor, lithographic apparatus, and substrate surface positioning method: US, 2013/0077079 A1[P]. 2013-03-28.

[11] J E van der Werf. Optical focus and level sensor for wafer steppers[J]. J Vac Sci Technol B, 1992, 10(2): 735-740.

[12] Feng Jinhua, Hu Song, Li Yanli, et al.. Nano focusing method based on moire fringe phase analysis[J]. Acta Optica Sinica, 2015, 35(2): 0212005.

[13] Hu Jianming, Zeng Aijun, Wang Xiangzhao. Polarization modulation technology for a position sensor with grating imaging[J]. Chinese J Lasers, 2006, 33(10): 1397-1401.

[14] Yan Wei, Li Yanli, Chen Mingyong, et al.. Moiré fringe-based focusing-test scheme for optical projection lithography[J]. Acta Optica Sinica, 2011, 31(8): 0805001.

[15] Li Jie, Tang Feng, Wang Xiangzhao, et al.. System errors analysis of grating lateral shearing interferometer[J]. Chinese J Lasers, 2014, 41(5): 0508006.

[16] Tong Junmin, Zhou Shaolin, Zhao Lixin, et al.. Angular measurement using moire interferometry for alignment of proximity lighography[J]. Chinese J Lasers, 2014, 41(12): 1208001.

[17] Cao Shaoqian, Bu Yang, Wang Xiangzhao, et al.. Measurement technique for the Mueller matrix based on a single photo-elastic modulator[J]. Acta Optica Sinica, 2013, 33(1): 0112006.

CLP Journals