[1] Cai Yanmin, Wang Xiangzhao, Huang Huijie. Design of Wollaston prism used for polarization illumination system in ArF lithography tool[J]. Chinese J Lasers, 2014, 41(6): 0616002.
[2] B Peng, X Wang, Z Qiu, et al.. Aberration-induced intensity imbalance of alternating phase-shifting mask in lithographic imaging[J]. Opt Lett, 2010, 35(9): 1404-1406.
[3] F Wang, X Wang, M Ma. Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools[J]. Appl Opt, 2006, 45(24): 6086-6093.
[4] T Fujii, J Kougo, Y Mizuno, et al.. Portable phase measuring interferometer using Shack-Hartmann method[C]. SPIE, 2003, 5038: 726-732.
[5] T Fujii, K Suzuki, Y Mizuno, et al.. Integrated projecting optics tester for inspection of immersion ArF scanner[C]. SPIE, 2006, 6152: 615237.
[6] Qi Yuejing, Lu Zengxiong, Yang Guanghua, et al.. Analysis of effect of mumerical aperture of illumination objective lens on quality of wavefront diffracted by tiny pinhole[J]. Chinese J Lasers, 2015, 42(2): 0208001.
[7] G Ding, Y Qi, Z Lu, et al.. Effect of illumination parameters on the quality of wavefront diffracted by pinhole[C]. SPIE, 2014, 9282: 92821U.
[8] Zheng Meng, Li Yanqiu, Liu Ke. Design of mask for phase- shifting point diffraction interferometer[J]. Laser & Optoelectronics Progress, 2013, 50(3): 031201.
[9] G Cao, X Yu. Accuracy analysis of a Hartmann-Shack wavefront sensor operated with a faint object[J]. Opt Eng, 1994, 33(7): 2331-2335.
[10] J Arines, J Ares. Minimum variance centroid thresholding[J]. Opt Lett, 2002, 27(7): 497-499.
[11] K Murakami, T Oshino, H Kondo, et al.. Development of EUV lithography tools at nikon[C]. SPIE, 2011, 7969: 79690P.
[12] C-S Koay, C Keyser, K Takenoshita, et al.. High conversion efficiency tin material laser plasma source for EUVL[C]. SPIE, 2003, 5037: 801-806.
[13] W T Silfvast, M Klosner, G M Shimkaveg, et al.. High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV lithography[C]. SPIE, 1999, 3676: 272-277.
[14] K Liu, Y Li, M Zheng, et al.. High numerical aperture Hartmann wavefront sensor with pinhole array extended source[C]. SPIE, 2012, 8550: 85503M.
[15] T Alien. Computational Electromagnetic: Finite-Difference Time-Domain method[M]. Boston: Artech House, 2005: 329-352.
[16] M Born, E Wolf. Principles of Optics[M]. Yang Jiasun, Transl. 7th edition. Beijing: Electronic Industry Press, 2005: 459-525.
[17] Lu Zengxiong, Jin Chunshui, Ma Dongmei. Rigorous vector analysis of the effect of illumination objective lens aberration on the quality of far-field diffracted wave front[J]. Acta Optica Sinica, 2012, 32(8): 0812001.
[18] Xie Changqing, Zhu Xiaoli, Niu Jiebin, et al.. Micro- and nano-metal structures fabrication technology and applications[J]. Acta Optica Sinica, 2011, 31(9): 0900128.
[19] N Kobayashi, K Goto, T Wakatsuki, et al.. Improvement of position accuracy in mask-writing electron beam lithography with a multi-pass writing strategy for reducing position errors due to resist charging[C]. SPIE, 2008, 7028: 70281Y.
