• Acta Photonica Sinica
  • Vol. 41, Issue 6, 695 (2012)
LI Hongguang*
Author Affiliations
  • [in Chinese]
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    DOI: 10.3788/gzxb20124106.0695 Cite this Article
    LI Hongguang. Structural and Optical Properties of Zn3N2 Films Prepared by Magnetron Sputtering in NH3Ar Mixture Gases[J]. Acta Photonica Sinica, 2012, 41(6): 695 Copy Citation Text show less
    References

    [1] ZHANG J, XIE E Q, FU Y J, et al. Influence of substrate temperature and nitrogen gas on zinc nitride thin films prepared by RF reactive sputtering[J]. Chinese Journal of Semiconductors, 2007, 28(8): 11731178.

    [2] FUTSUHARA M, YOSHIOKA K, TAKAI O. Structural, electrical and optical properties of zinc nitride thin films prepared by reactive rf magnetron sputtering[J]. Thin Solid Films, 1998, 322(12): 274281.

    [3] ZHANG Y Z, LU J G, YE Z Z, et al. Transparent p/n diode device from a single zinc nitride sputtering target[J]. Thin Solid Films, 2011, 520(4): 12021206.

    [4] VOULGAROPOULOU P, DOUNIS S, KAMBILAFKA V, et al. Optical properties of zinc nitride thin films fabricated by rfsputtering from ZnN target[J]. Thin Solid Films, 2008, 516(22): 81708174.

    [5] KHAN W S, CAO C B, PING D Y, et al. Optical properties and characterization of zinc nitride nanoneedles prepared from ballmilled Zn powders[J]. Materials Letters, 2011, 65(9): 12641267.

    [6] KAMBILAFKA V, KOSTOPOULOS A, ANDROULIDAKI M, et al. Lowresistivity Ni/Pt ohmic contacts to ptype Ndoped ZnO[J]. SolidState Electronics, 2010, 54(7): 732735.

    [7] LU Y F, YE Z Z, ZENG Y J, et al. The influence of postgrowth annealing on optical and electrical properties of ptype ZnO films[J]. Materials Science in Semiconductor Processing, 2007, 10(45): 215221.

    [8] ZHANG C Y. Effects of growth temperature on Li–N dualdoped ptype ZnO thin films prepared by pulsed laser deposition[J]. Applied Surface Science, 2008, 254(7): 19931996.

    [9] ZONG F J, MA H L, DU W, et al. Optical band gap of zinc nitride films prepared on quartz substrates from a zinc nitride target by reactive RF magnetron sputtering[J]. Applied Surface Science, 2006, 252(22): 79837986.

    [10] YANG T L, ZHANG Z S, LI Y H, et al. Structural and optical properties of zinc nitride films prepared by RF magnetron sputtering[J]. Applied Surface Science, 2009, 255(6): 35443547.

    [11] KAMBILAFKA V, VOULGAROPOULOU P, DOUNIS S, et al. Thermal oxidation of ntype ZnN films made by RFsputtering from a zinc nitride target, and their conversion into ptype films[J]. Superlattices and Microstructures, 2007, 42(1): 5561.

    LI Hongguang. Structural and Optical Properties of Zn3N2 Films Prepared by Magnetron Sputtering in NH3Ar Mixture Gases[J]. Acta Photonica Sinica, 2012, 41(6): 695
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