• Laser & Optoelectronics Progress
  • Vol. 51, Issue 5, 50004 (2014)
Shen Chao1、*, Cheng Xiang′ai1、2, Zhu Zhiwu3, Jiang Tian1, and Dai Yifan3
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
  • show less
    DOI: 10.3788/lop51.050004 Cite this Article Set citation alerts
    Shen Chao, Cheng Xiang′ai, Zhu Zhiwu, Jiang Tian, Dai Yifan. Research Progress in Laser Conditioning of Optical Materials[J]. Laser & Optoelectronics Progress, 2014, 51(5): 50004 Copy Citation Text show less
    References

    [1] H Bercegol. What is laser conditioning A review focused on dielectric multilayers [C]. SPIE, 1994, 3578: 421-426.

    [2] M R Kozlowski, M Staggs, F Rainer. Laser conditioning and electronic defects of HfO2 and SiO2 thin films [C]. SPIE, 1990, 1441: 269-282.

    [3] Mike Staggs, Ming Yan, Mike Runkel. Laser raster conditioning of KDP and DKDP crystals using XeCl and Nd:YAG lasers [C]. SPIE, 2001, 4347: 400-407.

    [4] Joseph A Menapace, Bernie Penetrante, Don Golini, et al.. Combined advanced finishing and UV-laser conditioning for producing UV-damage-resistant fused silica optics [C]. SPIE, 2002, 4679: 56-68.

    [5] J Swain, S Stokowski, D Milam, et al.. Improving the bulk laser damage resistance of potassium dihydrogen phosphate crystals by pulsed laser irradiation [J]. Appl Phys Lett, 1982, 40(4): 350-352.

    [6] Paul A Temple, W Howard Lowdermilk, David Milam. Carbon dioxide laser polishing of fused silica surfaces for increased laser-damage resistance at 1064 nm [J]. Appl Opt, 1982, 21(18): 3249-3255.

    [7] G Duchateau. Simple models for laser-induced damage and conditioning of potassium dihydrogen crystals by nanosecond pulses [J]. Opt Express, 2009, 17(13): 10434-10456.

    [8] M D Feit, A M Rubenchik, J B Trenholme. Simple model of laser damage initiation and conditioning in frequency conversion crystals [C]. SPIE, 2005, 5991: 59910W.

    [9] M D Feit, A M Rubenchik. Implications of nanoabsorber initiators for damage probability curves, pulselength scaling and laser conditioning [C]. SPIE, 2003, 5273: 74-82.

    [10] Anthony Dyan, Matthieu Pommi`es, Guillaume Duchateau, et al.. Revisited thermal approach to model laser- induced damage and conditioning process in KH2PO4 and D2xKH2(1-x)PO4 crystals [C]. SPIE, 2007, 6403: 640307.

    [11] Zhi M Liao, M L Spaeth, K Manes, et al.. Predicting laser- induced bulk damage and conditioning for deuterated potassium dihydrogen phosphate crystals using an absorption distribution model [J]. Opt Lett, 2010, 35(15): 2538-2540.

    [12] Wei Chaoyang, Zhao Yuanan, He Hongbo, et al.. Laser conditioning on optical thin film components [J]. Laser & Optoelectronics Progress, 2005, 42(5): 51-57.

    [13] Chen Meng, Yuan Xiaodong, Lü Haibing, et al.. Laser conditioning technology of optics [J]. Optical Technique, 2010, 36(1): 79-83.

    [14] A A Manenkov, A M Prokhorov. Laser-induced damage in solids [J]. Sov Phys Usp, 1986, 19(1): 104-122.

    [15] M F Koldunov, A A Manenkov, I L Pokolotilo. Interrelation of the laser- induced damage characteristics in statistical theory [J]. Quantum Electronics, 2000, 30(7): 592-596.

    [16] Chaoyang Wei, Hongbo He, Jianda Shao, et al.. Effects of CO2 laser conditioning of the antireflection Y2O3/SiO2 coatings at 351 nm [J]. Opt Commun, 2005, 252(4-6): 336-343.

    [17] Xiulan Ling, Yuanan Zhao, Dawei Li, et al.. Laser conditioning of high-reflective and anti-reflective coatings in vacuum environments [J]. Opt Commun, 2010, 283(13): 2728~2731.

    [18] Yuanan Zhao, Tao Wang, Dawei Zhang, et al.. Laser conditioning and multi-shot laser damage accumulation effects of HfO2/SiO2 antireflective coatings [J]. Applied Surface Science, 2005, 245(1-4): 335-339.

    [19] J E Swain, S E Stokowski, D Milam, et al.. The effect of baking and pulsed laser irradiation on the bulk laser damage threshold of potassium dihydrogen phosphate crystals [J]. Appl Phys Lett, 1982, 41(1): 12-14.

    [20] M E Frink, J W Arenberg, D W Mordaunt. Temporary laser damage threshold enhancement by laser conditioning of antireflection-coated glass [J]. Appl Phys Lett, 1987, 51(6): 415-418.

    [21] N C Kerr, D C Emmony. The effect of laser annealing on laser- induced damage threshold [J]. Journal of Modern Optics, 1990, 37(4): 787-802.

    [22] Shizhen Xu, Xiaodong Yuan, Wei Yin, et al.. Effect of UV laser conditioning on fused silica in vacuum [J]. Optical Materials, 2009, 31(6): 1013-1016.

    [23] Guohang Hu, Yuanan Zhao, Dawei Li, et al.. Transmittance increase after laser conditioning reveals absorption properties variation in DKDP crystals [J]. Opt Express, 2012, 20(22): 25169-25180.

    [24] G Guéhenneux, Ph Bouchut, M Veillerot, et al.. Impact of outgassing organic contamination on laser- induced damage threshold of optics: effect of laser conditioning [C]. SPIE, 1995, 5991: 1-11.

    [25] E Eva, K Mann, N Kaiser, et al.. Laser conditioning of LaF3/MgF2 dielectric coatings at 248 nm [J]. Appl Opt, 1996, 35(28): 5613-5619.

    [26] Dawei Li, Yuan′ an Zhao, Jianda Shao, et al.. 0.532- mm laser conditioning of HfO2/SiO2 third harmonic separator fabricated by electron-beam evaporation [J]. Chin Opt Lett, 2008, 6(5): 386-387.

    [27] M Schildbach, L L Chase, A V Hamza. Investigation of neutral atom and ion emission during laser conditioning of multilayer HfO2-SiO2 coatings [C]. SPIE, 1990, 1441: 287-293.

    [28] Liu Hao, Chen Songlin, Wei Yaowei, et al.. Laser conditioning on HfO2 film monitored by calorimeter [J]. Opt Express, 2012, 20(1): 698-705.

    [29] Paul DeMange, Christopher W Carr, Raluca A Negres, et al.. Laser annealing characteristics of multiple bulk defect populations within DKDP crystals [J]. J Appl Phys, 2008, 104(10): 103103.

    [30] Paul DeMange, Raluca A Negres, Christopher W Carr, et al.. Laser- induced defect reactions governing damage initiation in DKDP crystals [J]. Opt Express, 2006, 14(12): 5313-5328.

    [31] J J Adams, T L Weiland, J R Stanley, et al.. Pulse length dependence of laser conditioning and bulk damage in KD2PO4 [C]. SPIE, 2004, 5647: 265-278.

    [32] P DeMange, C W Carr, R A Negres, et al.. Multiwavelength investigation of laser- damage performance in potassium dihydrogen phosphate after laser annealing [J]. Opt Lett, 2005, 30(3): 221-223.

    [33] Lynn Sheehan, Mark Kozlowski, Frank Rainer, et al.. Large- area conditioning of optics for high- power laser systems [C]. SPIE, 1994, 2114: 559-568.

    [34] R A Negres, P DeMange, S G Demos. Investigation of laser annealing parameters for optimal laser- damage performance in deuterated potassium dihydrogen phosphate [J]. Opt Lett, 2005, 30(20): 2766-2768.

    [35] Laurent Gallais, Jérémie Capoulade, Jean-Yves Natoli, et al.. Investigation of nanodefect properties in optical coatings by coupling measured and simulated laser damage statistics [J]. J Appl Phys, 2008, 104(5): 053120.

    [36] Zhi M Liao, R Roussell, J J Adams, et al.. Defect population variability in deuterated potassium di-hydrogen phosphate crystals [J]. Optical Materials Express, 2012, 2(11): 1612-1623.

    [37] M F Koldunov, A A Manenkov. Theory of laser- induced inclusion- initiated damage in optical materials [J]. Opt Engineering, 2013, 51(12): 1-11.

    [39] M D Feit, A M Rubenchik. Analysis of raster scanning damage and conditioning experiments [C]. SPIE, 2003, 4932: 238-249.

    [40] M Runkel, M C Nostrand. An overview of rater scanning for ICF-class laser optics [C]. SPIE, 2003, 4932: 136-146.

    [41] Tayyab I Suratwala, Phil E Miller, Jeffery D Bude, et al.. HF- based etching processes for improving laser damage resistance of fused silica optical surfaces [J]. J Am Ceram Soc, 2011, 94(2): 416-428.

    CLP Journals

    [1] Yuan Ligang, Chen Guo, Hou Tianyu, Han Long, Zhao Hong, Wang Keqiang. Damage Threshold Measurement of 2 μm Laser on ZnGeP2 Crystal and Its Influencing Factors[J]. Chinese Journal of Lasers, 2015, 42(8): 802001

    Shen Chao, Cheng Xiang′ai, Zhu Zhiwu, Jiang Tian, Dai Yifan. Research Progress in Laser Conditioning of Optical Materials[J]. Laser & Optoelectronics Progress, 2014, 51(5): 50004
    Download Citation