[1] H J Ahn, H S Shim, Y S Kim, et al.. Synthesis and characterization of NiO-Ta2O5 nanocomposite electrode for electrochromic devices [J]. Electrochem Commun, 2005, 7(6): 567-571.
[2] A R Barman, M Motapothula, A Annadi, et al.. Multifunctional Ti1-xTaxO2Ta doping or alloying [J]. Appl Phys Lett, 2011, 98: 072111.
[3] N R Kalidindi, F S Manciu, C V Ramana. Crystal structure, phase, and electrical conductivity of nanocrystalline W0.95Ti0.05O3 thin films [J]. Appl Mater Interfaces, 2011, 3(3): 863-868.
[4] Zhao Lili, Su Ge, Cao Lixin, et al.. Fabrication and properties of Cu-doped NiO electrochromic thin films [J]. Acta Optica Sinica, 2011, 31(4): 0431001
[6] C Y Tai, J Y Wu. Observation of optical density modulation based on electrochromic tantalum oxide films [J]. J Phys D: Appl Phys, 2008, 41(6): 065303.
[7] K S Ahn, Y C Nah, Y E Sung, et al.. All-solid-state electrochromic device composed of WO3 and Ni(OH)2 with a Ta2O5 protective layer [J]. Appl Phys Lett, 2002, 81: 3930-3932.
[8] R Kirchgeorg, S Berger, P Schmuki. Ultra fast electrochromic switching of nanoporous tungsten-tantalum oxide films [J]. Chem Commun, 2011, 47(3): 1000-1002.
[9] H S Shim, H J Ahn, Y S Kim, et al.. Ta2O5-incorporated WO3 nanocomposite film for improved electrochromic performance in an acidic condition [J]. J Nanosci Nano Technol, 2006, 6(11): 3572-3576.
[10] D Yang, L Xue. Structures and electrochromic properties of Ta0.3W0.7Ox thin films deposited by pulsed laser ablation［J］. Thin Solid Films, 2006, 494: 28-32.
[11] X Sun, Z Liu, H Cao. Effects of film density on electrochromic tungsten oxide thin films deposited by reactive dc-pulsed magnetron sputtering [J]. J Alloys Compounds, 2010, 504(s1): S418-S421.
[12] S U Yun, S J Yoo, J W Lim, et al.. Enhanced electrochromic properties of Ir-Ta oxide grown using a cosputtering system [J]. J Electrochem Soc, 2010, 157(7): J256-J260.
