• Acta Optica Sinica
  • Vol. 30, Issue 8, 2284 (2010)
Li Xiao1、2、*, Liu Xiaofeng1、2, Shan Yongguang1、2, Zhao Yuanan1, Shao Jianda1, and Fan Zhengxiu1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    DOI: 10.3788/aos20103008.2284 Cite this Article Set citation alerts
    Li Xiao, Liu Xiaofeng, Shan Yongguang, Zhao Yuanan, Shao Jianda, Fan Zhengxiu. Mechanism of Laser-Conditioning ZrO2-SiO2 High Reflective Thin Film at 1064 nm[J]. Acta Optica Sinica, 2010, 30(8): 2284 Copy Citation Text show less

    Abstract

    The influence of laser-conditioning scanning process on the damage threshold and the initiating defects of ZrO2-SiO2 1064 nm high reflective (HR) coatings is analyzed.The changes of initiating defects in films are investigated before and after laser-conditioning scanning process based on that defects damage and density are used to characterize the initiating defects.The relation between the laser-conditioning energy density and the laser-conditioning effect is also investigated.It is found that the defects with lower threshold can be removed by laser-conditioning process.However,the defects with higher threshold can be transformed to defects with lower threshold when the scanning energy density is higher.So the laser energy density used in the laser-conditioning scanning process should be relatively lower.
    Li Xiao, Liu Xiaofeng, Shan Yongguang, Zhao Yuanan, Shao Jianda, Fan Zhengxiu. Mechanism of Laser-Conditioning ZrO2-SiO2 High Reflective Thin Film at 1064 nm[J]. Acta Optica Sinica, 2010, 30(8): 2284
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