Experimental study for ion beam sputtering deposition of Ta2O5 optical thin film

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Journals >Opto-Electronic Engineering >Volume 31 >Issue 3 >Page 41 > Article

Opto-Electronic Engineering
Vol. 31, Issue 3, 41 (2004)

Experimental study for ion beam sputtering deposition of Ta2O5 optical thin film

[in Chinese], [in Chinese], [in Chinese], and [in Chinese]

Author Affiliations

[in Chinese]

show less

DOI: Cite this Article

[in Chinese], [in Chinese], [in Chinese], [in Chinese]. Experimental study for ion beam sputtering deposition of Ta2O5 optical thin film[J]. Opto-Electronic Engineering, 2004, 31(3): 41 Copy Citation Text

show less

References

[1] AI-JUMAILY G A,EDLOU S M.Optical properties of tantalum pentoxide coatings deposited using ion beam processes[J].Thin Solid Film,1992,209(2):223-229.

[2] WEI D T.Ion beam interference coating for ultralow optical loss[J].Appl.Opt,1989,28(14):2813-2816.

[3] ZHANG Yun-dong,LIU Hong-xiang.Ion beam sputter deposition technique for the production of optical coatings[J].Opto-Electronic Engineering,2001,28(5):69-72.(in Chinese).

[4] HENKING R,RISTAU D,ALVENSLEBEN F V,et al .Optical characteristics and damage threshold of low mirrors[J].SPIE,1995,2428:281-292.

[in Chinese], [in Chinese], [in Chinese], [in Chinese]. Experimental study for ion beam sputtering deposition of Ta2O5 optical thin film[J]. Opto-Electronic Engineering, 2004, 31(3): 41

Download Citation

Tools

Save the article for my favorites

Paper Information