• Chinese Journal of Lasers
  • Vol. 50, Issue 13, 1305003 (2023)
Gang Wang1,2, Zhongliang Li1,2,*, Chunxiao Yuan1, and Fang Zhang1
Author Affiliations
  • 1Laboratory of Information Optics and Opto-Electronics Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
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    DOI: 10.3788/CJL221435 Cite this Article Set citation alerts
    Gang Wang, Zhongliang Li, Chunxiao Yuan, Fang Zhang. Design and Simulation of Illumination Uniformity Unit in Lithography Illumination Systems[J]. Chinese Journal of Lasers, 2023, 50(13): 1305003 Copy Citation Text show less
    Simplified structure of a lithography machine
    Fig. 1. Simplified structure of a lithography machine
    Illumination modes and partial coherence factor. (a) Conventional illumination; (b) annular illumination; (c) dipole illumination; (d) quadrupole illumination
    Fig. 2. Illumination modes and partial coherence factor. (a) Conventional illumination; (b) annular illumination; (c) dipole illumination; (d) quadrupole illumination
    Structure of the uniformity unit based on MLA
    Fig. 3. Structure of the uniformity unit based on MLA
    Schematic of the uniform effect of the integrator rod
    Fig. 4. Schematic of the uniform effect of the integrator rod
    Schematics of the optical principle of the integrator rod. (a) Angle channels; (b) virtual point sub-sources
    Fig. 5. Schematics of the optical principle of the integrator rod. (a) Angle channels; (b) virtual point sub-sources
    Variation of the input with a uniform distribution after free propagation. (a) Uniform distribution of the input in phase space; (b) distribution in phase space after free propagation of the input; (c) irradiance distribution of the input; (d) irradiance distribution of the unfolded output
    Fig. 6. Variation of the input with a uniform distribution after free propagation. (a) Uniform distribution of the input in phase space; (b) distribution in phase space after free propagation of the input; (c) irradiance distribution of the input; (d) irradiance distribution of the unfolded output
    Superposition distribution results of edge channels. (a) A uniform result; (b) a non-uniform result
    Fig. 7. Superposition distribution results of edge channels. (a) A uniform result; (b) a non-uniform result
    Simulation results of the output irradiance profile under different source widths in x direction. (a) Width of the source is smaller than that of the integrator rod; (b) width of the source is equal to that of the integrator rod
    Fig. 8. Simulation results of the output irradiance profile under different source widths in x direction. (a) Width of the source is smaller than that of the integrator rod; (b) width of the source is equal to that of the integrator rod
    Structure scheme of the proposed illumination uniformity unit. (a) Structure in the X direction (top view); (b) structure in the Y direction (front view)
    Fig. 9. Structure scheme of the proposed illumination uniformity unit. (a) Structure in the X direction (top view); (b) structure in the Y direction (front view)
    Geometric principle of the ray distribution in the uniformity unit (top view)
    Fig. 10. Geometric principle of the ray distribution in the uniformity unit (top view)
    Structure diagram of the micro-cylindrical lens
    Fig. 11. Structure diagram of the micro-cylindrical lens
    Profile of absolute error of the exiting rays’ direction cosine of the micro-cylindrical lens
    Fig. 12. Profile of absolute error of the exiting rays’ direction cosine of the micro-cylindrical lens
    Optical structure diagram of the condenser lens
    Fig. 13. Optical structure diagram of the condenser lens
    Profile of absolute error of the exiting rays’ direction cosine of the condenser lens
    Fig. 14. Profile of absolute error of the exiting rays’ direction cosine of the condenser lens
    Simulation model for the illumination uniformity unit (axonometric view)
    Fig. 15. Simulation model for the illumination uniformity unit (axonometric view)
    Diagram and profile of irradiance of the input illumination field under the conventional mode with σ=0.88
    Fig. 16. Diagram and profile of irradiance of the input illumination field under the conventional mode with σ=0.88
    Diagram of irradiance of the output illumination field under the conventional mode with σ=0.88
    Fig. 17. Diagram of irradiance of the output illumination field under the conventional mode with σ=0.88
    Normalized integrated irradiance profiles. (a) Conventional illumination mode; (b) annular illumination mode
    Fig. 18. Normalized integrated irradiance profiles. (a) Conventional illumination mode; (b) annular illumination mode
    SurfaceSurface typeRadius /mmThickness /mmGlassSemi-aperture /mm
    ObjectSphereInf.Inf.
    1(stop)SphereInf.00.3
    2Y toroid0.8141.8'C7980'0.3
    3SphereInf.0.4070.3
    4(image)SphereInf.00.3
    Table 1. Structure parameters of the micro-cylindrical lens
    SurfaceSurface typeRadius /mmThickness /mmGlassSemi-aperture /mm
    ObjectSphereInf.Inf.
    1(stop)SphereInf.21.2423.5
    2Sphere-170.6352.89'C7980'53.5
    3Sphere-90.5815.5653.5
    4Sphere150.3931.41'C7980'71.0
    5Sphere-562.1059.8671.0
    6Asphere-3175.9749.04'C7980'72.5
    7Sphere-136.0925.4772.5
    8(image)SphereInf.-5.4765.5
    Table 2. Structure parameters of the condenser lens
    Illumination modeσIINU of scheme A /%Corrected IINU of scheme A /%IINU of scheme B /%
    Conventional mode0.880.310.49
    0.520.421.51
    0.280.590.350.75
    Annular mode[0.88,0.64]0.550.370.63
    [0.88,0.20]0.280.43
    [0.44,0.20]0.421.08
    TargetIINU is less than or equal to 0.46%
    Table 3. IINU of input optical field of A and B groups under different σ values
    Gang Wang, Zhongliang Li, Chunxiao Yuan, Fang Zhang. Design and Simulation of Illumination Uniformity Unit in Lithography Illumination Systems[J]. Chinese Journal of Lasers, 2023, 50(13): 1305003
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