Design and Simulation of Illumination Uniformity Unit in Lithography Illumination Systems

Gang Wang; Zhongliang Li; Chunxiao Yuan; Fang Zhang

doi:10.3788/CJL221435

Journals >Chinese Journal of Lasers >Volume 50 >Issue 13 >Page 1305003 > Article

Chinese Journal of Lasers
Vol. 50, Issue 13, 1305003 (2023)

Design and Simulation of Illumination Uniformity Unit in Lithography Illumination Systems

Gang Wang^1,2, Zhongliang Li^1,2,*, Chunxiao Yuan¹, and Fang Zhang¹

Author Affiliations

¹Laboratory of Information Optics and Opto-Electronics Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²University of Chinese Academy of Sciences, Beijing 100049, China

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DOI: 10.3788/CJL221435 Cite this Article Set citation alerts

Gang Wang, Zhongliang Li, Chunxiao Yuan, Fang Zhang. Design and Simulation of Illumination Uniformity Unit in Lithography Illumination Systems[J]. Chinese Journal of Lasers, 2023, 50(13): 1305003 Copy Citation Text

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Article index updated: Jun. 30, 2025

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Gang Wang, Zhongliang Li, Chunxiao Yuan, Fang Zhang. Design and Simulation of Illumination Uniformity Unit in Lithography Illumination Systems[J]. Chinese Journal of Lasers, 2023, 50(13): 1305003

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