• Chinese Journal of Lasers
  • Vol. 50, Issue 13, 1305003 (2023)
Gang Wang1,2, Zhongliang Li1,2,*, Chunxiao Yuan1, and Fang Zhang1
Author Affiliations
  • 1Laboratory of Information Optics and Opto-Electronics Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
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    DOI: 10.3788/CJL221435 Cite this Article Set citation alerts
    Gang Wang, Zhongliang Li, Chunxiao Yuan, Fang Zhang. Design and Simulation of Illumination Uniformity Unit in Lithography Illumination Systems[J]. Chinese Journal of Lasers, 2023, 50(13): 1305003 Copy Citation Text show less
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    The article is cited by 5 article(s) CLP online library. (Some content might be in Chinese.)
    Gang Wang, Zhongliang Li, Chunxiao Yuan, Fang Zhang. Design and Simulation of Illumination Uniformity Unit in Lithography Illumination Systems[J]. Chinese Journal of Lasers, 2023, 50(13): 1305003
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