Research on the application of circular off-field instantaneous photoelastic phaseshift splicing measurement based on ultra-depth of field algorithm

Xiaoxiao WEI; Zhenlei WANG; Jiaxin WANG; Zhenqiu DAI

doi:10.3969/j.issn.1005-5630.202311140125

Journals >Optical Instruments >Volume 46 >Issue 6 >Page 42 > Article

Optical Instruments
Vol. 46, Issue 6, 42 (2024)

Research on the application of circular off-field instantaneous photoelastic phaseshift splicing measurement based on ultra-depth of field algorithm

Xiaoxiao WEI^*, Zhenlei WANG, Jiaxin WANG, and Zhenqiu DAI

Author Affiliations

School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China

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DOI: 10.3969/j.issn.1005-5630.202311140125 Cite this Article

Xiaoxiao WEI, Zhenlei WANG, Jiaxin WANG, Zhenqiu DAI. Research on the application of circular off-field instantaneous photoelastic phaseshift splicing measurement based on ultra-depth of field algorithm[J]. Optical Instruments, 2024, 46(6): 42 Copy Citation Text

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References

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