• Optical Instruments
  • Vol. 46, Issue 6, 42 (2024)
Xiaoxiao WEI*, Zhenlei WANG, Jiaxin WANG, and Zhenqiu DAI
Author Affiliations
  • School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China
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    DOI: 10.3969/j.issn.1005-5630.202311140125 Cite this Article
    Xiaoxiao WEI, Zhenlei WANG, Jiaxin WANG, Zhenqiu DAI. Research on the application of circular off-field instantaneous photoelastic phaseshift splicing measurement based on ultra-depth of field algorithm[J]. Optical Instruments, 2024, 46(6): 42 Copy Citation Text show less
    Schematic diagram of instantaneous photoelastic method of circular off-field over depth of field
    Fig. 1. Schematic diagram of instantaneous photoelastic method of circular off-field over depth of field
    Experimental results of ultra-depth field algorithm
    Fig. 2. Experimental results of ultra-depth field algorithm
    Equipment structure diagram
    Fig. 3. Equipment structure diagram
    Single field ultra depth of field diagram(left)Splicing path diagram(right)
    Fig. 4. Single field ultra depth of field diagram(left)Splicing path diagram(right)
    Splicing schematic
    Fig. 5. Splicing schematic
    Stress values under different focusing states
    Fig. 6. Stress values under different focusing states
    高度/mm6 inch晶圆局部对比1局部对比2
    0
    4
    8
    12
    16
    20
    24
    28
    景深合成
    Table 1. Comparison of stress images
    Xiaoxiao WEI, Zhenlei WANG, Jiaxin WANG, Zhenqiu DAI. Research on the application of circular off-field instantaneous photoelastic phaseshift splicing measurement based on ultra-depth of field algorithm[J]. Optical Instruments, 2024, 46(6): 42
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