Imaging interferometric lithography and its spatial frequency analysis

[in Chinese]; [in Chinese]; [in Chinese]

Journals >Opto-Electronic Engineering >Volume 31 >Issue 10 >Page 24 > Article

Opto-Electronic Engineering
Vol. 31, Issue 10, 24 (2004)

Imaging interferometric lithography and its spatial frequency analysis

[in Chinese]^1、2, [in Chinese]¹, and [in Chinese]¹

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¹[in Chinese]

²[in Chinese]

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DOI: Cite this Article

[in Chinese], [in Chinese], [in Chinese]. Imaging interferometric lithography and its spatial frequency analysis[J]. Opto-Electronic Engineering, 2004, 31(10): 24 Copy Citation Text

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References

[3] CHEN Xiao-lan,BRUECK S R.Imaging interferometric lithography for arbitrary patterns [J].SPIE,1998,3331:214-224.

[4] CHEN Xiao-lan,FRAUENGLASS A,BRUECK S R.Interometric lithography pattern delimited by a mask image [J].SPIE,1998,3331:496-502.

[5] BRUECK S R,CHEN Xiao-lan.Spatial frequency analysis of optical lithography resolution enhancement techniques [J].SPIE,1999,3679:715-725.

[6] CHEN Xiao-lan,BRUECK S R.Imaging interferometric lithography:approaching the resolution limits of optics [J].Opt.Lett,1999,24(3):124-126.

[in Chinese], [in Chinese], [in Chinese]. Imaging interferometric lithography and its spatial frequency analysis[J]. Opto-Electronic Engineering, 2004, 31(10): 24

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