Effects of Temperature on the Preparation of Al/Zn3N2 Thin Films Using Magnetron Reactive Sputtering

[1] Erdogan N H,Kara K,Ozdamar H,et al.Applied Surface Science,2013,271:70.

[2] Jiang Nanke,Daniel G Georgiev,Wen Ting,et al.Thin Solid Film,2012,520:1698.

[3] Wen Ting,Madhav Gautam,Amir M Soleimanpour,et al.Materials Science in Semiconductor Processing,2013,16:318.

[4] Jayatissa A H,Wen T.Surface & Coatings Technology,2012,211:163.

[5] Khoshman J M,Peica N,Thomsen C,et al.Thin Solid Films,2012,520:7230.

[6] Lecoq E ,Duday D,Bulou S,et al.Plasma Processes and Polymers,2013,10:250.

[7] Hsieh Y L,Chang S Y,Li TT,et al.ECS Transactions,2013,52:473.

[8] Novotny,Michal Bulír,Jirí Petr,et al.Surface and Coatings Technology,2013,228:466.

[9] Alexandre L Souza,Sherlan G Lemos,Pedro V Oliveira.Spectrochimica Acta Part B,2011,66:383.

[10] Helmut Lindner,Loper,Kristofer H,et al.Spectrochimica Acta Part B,2011,66:179.

[11] Fu Silie,Chen Junfang,Zhang Hongbing,et al.Journal of Crystal Growth,2009,311:3325.

[12] Le Quang D,Babou Y,Andre P.IOP Conference Series:Materials Science and Engineering,2012,29:013009(13).

[13] Guberman S L.Journal of Chemical Physics,2012,137:074309(16).

[14] Hanif M,Salik M,Baig M A.Plasma Chemistry and Plasma Processing,2013,33:1167.