• Acta Photonica Sinica
  • Vol. 36, Issue 6, 1097 (2007)
[in Chinese]
Author Affiliations
  • [in Chinese]
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    DOI: Cite this Article
    [in Chinese]. Properties of Silicon Nitride Films Deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition[J]. Acta Photonica Sinica, 2007, 36(6): 1097 Copy Citation Text show less
    References

    [2] NAGEL H,SCHMIDT J,ABERLE A G,et al.Exceptionally high bulk minority-carrier lifetime in block-cast multicrystalline silicon[C].Proceedings of the 14th European Photovoltaic Solar Energy Conference,Stephens,Bedford,1997:762-765.

    [3] ABERLE A G.Overview on SiN surface passivation of crystalline silicon solar cells[J].Solar Energy Materials & Solar Cells,2001,65(1):239 -248.

    [7] SOPORI B,DENG X,BERNNER J P,et al.Hydrogen in silicon:A discussion of diffusion and passivation mechanisms[J].Solar Energy Materials & Solar Cells,1996,41 (1-4):159-169.

    [8] ROHATGI A,YELUNDUR V,JEONG J,et al.Fundamental understanding and implementation of al-enhanced PECVD SiNx hydrogenation in silicon ribbons[J].Solar Energy Materials & Solar Cells,2002,74(1-4):117-126.

    [9] RAY S K,DAS K,MAITI C K,et al.Effect of reactive-ion bombardment on the properties of silicon nitride and oxynitride films deposited by ion-beam sputtering[J].Journal of Applied Physics,1994,75(12):8145-8152.

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    [in Chinese]. Properties of Silicon Nitride Films Deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition[J]. Acta Photonica Sinica, 2007, 36(6): 1097
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