Improving the aspect ratio of ion beam etched trenches in HgCdTe

JIA Jia; LIU Shi-Jia; LIU Xiang-Yang; SUN Yan; LI Xiang-Yang

doi:10.11972/j.issn.1001-9014.2015.03.005

Journals >Journal of Infrared and Millimeter Waves >Volume 34 >Issue 3 >Page 282 > Article

Journal of Infrared and Millimeter Waves
Vol. 34, Issue 3, 282 (2015)

Improving the aspect ratio of ion beam etched trenches in HgCdTe

JIA Jia^1、2, LIU Shi-Jia^1、2, LIU Xiang-Yang^1、2, SUN Yan³, and LI Xiang-Yang^1、2

Author Affiliations

¹[in Chinese]

²[in Chinese]

³[in Chinese]

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DOI: 10.11972/j.issn.1001-9014.2015.03.005 Cite this Article

JIA Jia, LIU Shi-Jia, LIU Xiang-Yang, SUN Yan, LI Xiang-Yang. Improving the aspect ratio of ion beam etched trenches in HgCdTe[J]. Journal of Infrared and Millimeter Waves, 2015, 34(3): 282 Copy Citation Text

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References

[1] TENNANT W E, THOMAS M, et al. A Novel Simultaneous Unipolar Multispectral Integrated Technology Approach for HgCdTe IR Detectors and Focal Plane Arrays ［J］.Journal of Electronic Materials, 2001, 30(6): 590-594.

[4] AUSNITZER T Cl, LIMPERT J, ZOLLNER K, et al. Highly efficient transmission gratings infused silica for chirped-puls eamplification systems ［J］. Applied Optics, 2003, 42 (34): 6934 -6938.

JIA Jia, LIU Shi-Jia, LIU Xiang-Yang, SUN Yan, LI Xiang-Yang. Improving the aspect ratio of ion beam etched trenches in HgCdTe[J]. Journal of Infrared and Millimeter Waves, 2015, 34(3): 282

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