Analysis of laser induced thermal mechanical relationship of HfO2/SiO2 high reflective optical thin film at 1064 nm

Gang Dai; Yanbei Chen; Jian Lu; Zhonghua Shen; Xiaowu Ni

doi:10.3788/COL20090707.0601

Journals >Chinese Optics Letters >Volume 7 >Issue 7 >Page 07601 > Article

Chinese Optics Letters
Vol. 7, Issue 7, 07601 (2009)

Analysis of laser induced thermal mechanical relationship of HfO2/SiO2 high reflective optical thin film at 1064 nm

Gang Dai, Yanbei Chen, Jian Lu, Zhonghua Shen, and Xiaowu Ni

Author Affiliations

School of Science, Nanjing University of Science and Technology, Nanjing 210094, China

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DOI: 10.3788/COL20090707.0601 Cite this Article Set citation alerts

Gang Dai, Yanbei Chen, Jian Lu, Zhonghua Shen, Xiaowu Ni. Analysis of laser induced thermal mechanical relationship of HfO2/SiO2 high reflective optical thin film at 1064 nm[J]. Chinese Optics Letters, 2009, 7(7): 07601 Copy Citation Text

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