Analysis of laser induced thermal mechanical relationship of HfO2/SiO2 high reflective optical thin film at 1064 nm

Gang Dai; Yanbei Chen; Jian Lu; Zhonghua Shen; Xiaowu Ni

doi:10.3788/COL20090707.0601

Journals >Chinese Optics Letters >Volume 7 >Issue 7 >Page 07601 > Article

Chinese Optics Letters
Vol. 7, Issue 7, 07601 (2009)

Analysis of laser induced thermal mechanical relationship of HfO2/SiO2 high reflective optical thin film at 1064 nm

Gang Dai, Yanbei Chen, Jian Lu, Zhonghua Shen, and Xiaowu Ni

Author Affiliations

School of Science, Nanjing University of Science and Technology, Nanjing 210094, China

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DOI: 10.3788/COL20090707.0601 Cite this Article Set citation alerts

Gang Dai, Yanbei Chen, Jian Lu, Zhonghua Shen, Xiaowu Ni, "Analysis of laser induced thermal mechanical relationship of HfO2/SiO2 high reflective optical thin film at 1064 nm," Chin. Opt. Lett. 7, 07601 (2009) Copy Citation Text

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Abstract

A numerical model is developed for the calculation of transient temperature field of thin film coating induced by a long-pulsed high power laser beam. The electric field intensity distribution of HfO2/SiO2 high reflective (HR) film is investigated to calculate the thermal field of the film. The thermal-mechanical relationships are discussed to predict the laser damage area of optical thin film under long pulse high energy laser irradiation.

Keywords

140.0140 160.4670 310.0310