Thermal Oxidation about Big Area Silicon Wafer with High Aspect Ratio Microstructure

LUO Jian-dong; ZHOU Bin; Lü Wen-feng; LEI Yao-hu; GUO Jin-chuan; NIU Han-ben

doi:10.3969/j.issn.1003-501x.2012.08.016

[1] CAO Yu-dong, LI Ze-ren. Parameter Optimization for Step Blurred Edge Distribution Feature in X-ray In-line Phase Contrast Imaging [J]. Opto-Electronic Engineering, 2010, 37(3)：44-50.

[2] MA Jie, CAO Lei-feng, XIE Chang-qing, et al. Fabrication of High Aspect-ratio Hard X-Ray Zone Plates with Supporting Structures [J]. Opto-Electronic Engineering, 2009, 36(10)：30-34.

[3] Franz Pfeiffer, Timm Weitkamp, Oliver Bunk, et al. Phase retrieval and differential phase-contrast imaging with low-brilliance x-ray sources [J]. Nature Physics (S1745-2473), 2006, 2：258-261.

[4] Pfeiffer F, Bech M, Bunk O, et al. Hard-x-ray dark field imaging using a grating interferometer [J]. Nature Materials (S0028-0836), 2008, 7：134-137.

[5] Timm Weitkamp, Ana Diaz, Christian David. X-ray phase imaging with a grating interferometer [J]. Optics Express(S1904-4087), 2005, 13(16)：6296-6304.

[6] CP Beetz, R Boerstler, J Steinbeck, et al. Silicon-micromachined microchannel plates [J]. Nuclear Instruments and Methods in Physics Research A(S0168-9002), 2000, 442：443-451.

[7] Shank S M, Soave R J, Then A M, et al. Fabrication of high aspect ratio structures for micro-channel plates [J]. Journal of Vacuum Science & Technology B：Microelectronics and Nanometer Structures (S0022-5355), 1995, 13(6)：2736-2740.

[8] Lehmanm V. Electrochemistry of Silicon [M]. Weinheim：Wiley-VCH Verlag GmbH, 2002.

[9] Uematsu M, Kageshima H, Shiraishi K, et al. Two-dimensional Simulation of pattern-dependent Oxidation of Silicon nanostructures on Silicon-on-insulator substrates [J]. Solid-State Electronics(S0038-1101), 2004, 48：1073-1078.

[10] WANG Xiao-yan, ZHAI Xiu-jing, ZHANG Ting-an, et al. Thermal Stability of Mechanical Property and Thermal Expand Coefficient of Silicone Chip [J]. Vacuum and Cryogenics, 2009, 15(3)：156-159.

[11] Campell S A. The Science And Engineering of Microelectronic Fabrication：Second Edition [M]. Beijing：Publishing House of Electronics Industry, 2003：39-127.