• Acta Optica Sinica
  • Vol. 32, Issue 12, 1225001 (2012)
Yue Yuanbin*, Wang Xibin, Sun Jian, Zhang Kun, Sun Xiaoqiang, and Zhang Daming
Author Affiliations
  • [in Chinese]
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    DOI: 10.3788/aos201232.1225001 Cite this Article Set citation alerts
    Yue Yuanbin, Wang Xibin, Sun Jian, Zhang Kun, Sun Xiaoqiang, Zhang Daming. Application of Ultraviolet Photo-Resist in Polymeric Quasi-Rectangle Electro-Optical Waveguide[J]. Acta Optica Sinica, 2012, 32(12): 1225001 Copy Citation Text show less

    Abstract

    The polymer waveguide electro-optic (EO) devices play a key role in improving the optical network bandwidth and capacity. A quasi-rectangle EO waveguide based on organic/inorganic hybrid material (OIHM) is designed and fabricated. SiO2 is adopted as the lower cladding. The ultraviolet photo-resist SU-8 is used as the guiding core. The chromophore of dispersed red 1 (DR1) doped OIHM is used as the EO active layer. Through optimizing the parameters including antenna power, biasing power and O2 flow rate of inductively coupled plasma (ICP) etching, SU-8 can be applied as the guide core and etching mask at the same time. By the traditional semiconductor processes, the quasi-rectangle EO waveguide device is successfully fabricated. Under this condition, the transmission loss is -3.5 dB/cm.
    Yue Yuanbin, Wang Xibin, Sun Jian, Zhang Kun, Sun Xiaoqiang, Zhang Daming. Application of Ultraviolet Photo-Resist in Polymeric Quasi-Rectangle Electro-Optical Waveguide[J]. Acta Optica Sinica, 2012, 32(12): 1225001
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