[1] Havry J. Levinson. Principles of Lithography[M]. Washington: SPIE Press, 2001
[2] Ming L. Yu, Allan Sagle, Benny Buller. Exploring the fundamental limit of CD control: a model for shot noise in lithography[C]. Proc. SPIE, 2005, 5751: 687～698
[3] Soichi Inoue, Tadahito Fujisawa, Kyoko Izuha. Effective exposure dose measurement in optical microlithography[C]. Proc. SPIE, 2001, 3998: 810～818
[4] Gregory J. Kivenzor. Self-sustaining dose control system: ways to improve the exposure process[C]. Proc. SPIE, 2000, 4000:835～842
[5] Palash Das. Excimer laser as a total light source solution for DUV microlithography[C]. Proc. SPIE, 2001, 4184: 323～329
[6] G. M. Blumenstock, C. Meinert, N. R. Farrar et al.. Evaluation of light source technology to support immersion and EUV lithography[C]. Proc. SPIE, 2005, 5645: 188～195
[7] G. de Zwart, M. van den Brink, R. George et al.. Performance of a step-and-scan system for DUV lithography[C]. Proc. SPIE, 1997, 3051: 817～835
[8] Wolfgang Zschocke, Hans-Stephan Albrecht, Thomas Schrder et al.. High repetition rate excimer lasers for 193 nm lithography[C]. Proc. SPIE, 2002, 4691: 1722～1733
[9] Martin van den Brink, Hans Jasper, Steve Slonaker et al.. Step-and-scan and step-and-repeat, a technology comparison[C]. Proc. SPIE, 1996, 2726: 734～753
