• Acta Optica Sinica
  • Vol. 24, Issue 4, 437 (2004)
[in Chinese]*, [in Chinese], [in Chinese], and [in Chinese]
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  • [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study of Residual Stress in ZrO2 Thin Films[J]. Acta Optica Sinica, 2004, 24(4): 437 Copy Citation Text show less
    References

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    [2] Gao Pengtao, Meng L G, dos Santos M P. Influence of sputtering power and the substrate-target distance on the properties of ZrO2 films prepared by RF reactive sputtering. Thin Solid Films, 2000, 377~378:557~561

    [3] Mehner A, Klümper-Westkamp H, Hoffman F. Crystallization and residual stress formation of sol-gel-derived zirconia films. Thin Solid Films, 1997, 308~309:363~368

    [4] Tamulevicius S. Stress and strain in the vacuum deposited thin films. Vacuum, 1998, 51(2):127~138

    [5] Thielsch R, Gatto A, Kaiser N. Mechanical stress and thermal-elastic properties of oxide coatings for use in the deep-ultraviolet spectral region. Appl. Opt., 2002, 41(16):3211~3216

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Study of Residual Stress in ZrO2 Thin Films[J]. Acta Optica Sinica, 2004, 24(4): 437
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