Author Affiliations
1Shanghai Institute of Measurement and Testing Technology, Shanghai 201203, China2Shanghai Key Laboratory of Online Test and Control Technology, Shanghai 2012032, China3School of Physical Science and Engineering, Tongji University, Shanghai 200082, Chinashow less
Fig. 1. Optical path diagram of system construction
Fig. 2. Flow chart of adaptive differential evolution algorithm
Fig. 3. Iterative curve of 104.2 nm SiO2/Si standard sample
Fig. 4. Iterative curve of 398.4 nm SiO2/Si standard sample
Fig. 5. Mueller spectrum of 104.2 nm SiO2/Si film thick sample
Fig. 6. Mueller spectrum of 398.4 nm SiO2/Si film thick sample
Fig. 7. Index of refractive and extinction coefficient of 104.2 nm standard sample
Fig. 8. Index of refractive and extinction coefficient of 398.4 nm standard sample
Fig. 9. Iterative curve of 104.2 nm SiO2/Si standard sample
Fig. 10. Iterative curve of 398.4 nm SiO2/Si standard sample
Fig. 11. Measurement of ellipsometry parameters of 104.2 nm SiO2/Si standard sample
Fig. 12. Measurement of ellipsometry parameters of 398.4 nm SiO2/Si standard sample
Element | Parameter | Calibration value/(º) | Polarizer P | Orientation AS | 45 | Waveplate C1 | Initial orientation c1 | 0 | Waveplate C1 | Retardation Δ1 | 90 | Waveplate C2 | Initial orientation c2 | 0 | Waveplate C2 | Retardation Δ2 | 90 | Analyzer A | Orientation PS | −45 |
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Table 1. System component parameter values
Mueller element | Fitting error | m12 | 0.386 | m21 | 0.386 | m33 | 0.258 | m34 | 0.232 | m43 | 0.374 | m44 | 0.392 |
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Table 2. MSE of 104.2 nm sample
Mueller element | Fitting error | m12 | 0.412 | m21 | 0.412 | m33 | 0.365 | m34 | 0.409 | m43 | 0.384 | m44 | 0.422 |
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Table 3. MSE of 398.4 nm sample
Film thickness/nm | Calculated film thickness/nm | Relative error | 104.2±0.4 | 103.8±0.6 | 0.38% | 398.4±0.4 | 397.8±0.6 | 0.15% |
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Table 4. Calculated value of sample thickness
Film thickness
/nm
| Algorithm | Number of iterations | Iteration time/s | Calculated film thickness/nm | Relative error | 104.2 | SADE | 68 | 1.22 | 103.8±0.6 | 0.38% | LM | 54 | 1.13 | 104.6±0.6 | 0.78% | 398.4 | SADE | 82 | 1.47 | 397.8±0.6 | 0.15% | LM | 56 | 1.21 | 401.1±0.6 | 0.82% |
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Table 5. Comparison of experimental results
Film thickness/nm | Calculated film thickness/nm | Relative error | 104.2±0.4 | 104.1±0.6 | 0.09% | 398.4±0.4 | 398.2±0.6 | 0.05% |
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Table 6. Calculated value of sample thickness