[1] Otto O W, Garofalo J G, Yuan C M et al.. Automated optical proximity correction: A rule-based approach. Proc. SPIE, 1994, 2197:278~293
[2] Inoue S. Automatic optical proximity correction with optimization of stepper condition. Proc. SPIE, 1995, 2440:240~251
[3] Chen J F. Practical method for full-chip optical proximity correction. Proc. SPIE, 1997, 3051:790~803
[4] Levenson M D. Extending the lifetime of optical lithography technologies with wavefront engineering. Jpn. J. Appl. Phys., 1994, 33(12B):6765~6773