• Semiconductor Optoelectronics
  • Vol. 45, Issue 5, 687 (2024)
LI Ming1, FU Jing2, JIANG Junxian1, LIU Geyang1, and NI Piao1
Author Affiliations
  • 1Chongqing Optoelectronics Research Institute, Chongqing 400060, CHN
  • 2National Key Laboratory of Integrated Circuits and Microsystems, Chongqing 400000, CHN
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    DOI: 10.16818/j.issn1001-5868.2024042805 Cite this Article
    LI Ming, FU Jing, JIANG Junxian, LIU Geyang, NI Piao. Design of Monolithic Integrated High-Response Photodetection Device[J]. Semiconductor Optoelectronics, 2024, 45(5): 687 Copy Citation Text show less

    Abstract

    To address the compatibility issue of photodetection units with standard processes and the difficulty in combining monolithic integration with process technology, a monolithic integrated high-response photodetection device based on complementary bipolar standard process is proposed. A monolithic integration scheme for photodetectors accompanied by a signal-processing circuit is adopted to conduct the design and simulation of a high-response photodetection unit and a low-latency, high-rate signal-processing unit, thus realizing the monolithic integration of the device, process-technology merging, and high-response photodetection. Test results show that the photoelectric response characteristics and signal-processing functions are normal, and the required photoelectric detection parameters such as high response (peak response reaching 0.462 A/W), high data output rate (maximum of 12 Mbd), low transmission delay (less than 41.8 ns), low output logic level (0.15 V), and low output leakage (less than 1.5 μA) are achieved. The overall technical performance of the proposed device is excellent and satisfies the application requirements of miniaturized, highly integrated, and low-cost photodetection systems.