Preparation and Characteristics of Middle and Far Infrared Stealth of Photonic Crystal Film

Ruihuang Liu; Dapeng Zhao; Jikui Zhang; Hailong Dong; Jiaming Shi

doi:10.3788/AOS201838.0816001

Journals >Acta Optica Sinica >Volume 38 >Issue 8 >Page 0816001 > Article

Acta Optica Sinica
Vol. 38, Issue 8, 0816001 (2018)

Preparation and Characteristics of Middle and Far Infrared Stealth of Photonic Crystal Film

Ruihuang Liu^*, Dapeng Zhao, Jikui Zhang, Hailong Dong, and Jiaming Shi^*

Author Affiliations

State Key Laboratory of Pulsed Power Laser Technology, National University of Defense Technology, Hefei, Anhui 230037, China

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DOI: 10.3788/AOS201838.0816001 Cite this Article Set citation alerts

Ruihuang Liu, Dapeng Zhao, Jikui Zhang, Hailong Dong, Jiaming Shi. Preparation and Characteristics of Middle and Far Infrared Stealth of Photonic Crystal Film[J]. Acta Optica Sinica, 2018, 38(8): 0816001 Copy Citation Text

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