There are some minute peaked particles on the surface of semiconductor substrate during production. Sizes of the particles are usually several microns. If the height of any particle exceeds a standard value, there will be many defect wares during snagging and buffing when processed on the assembly-line. All that could affect the producing efficiency. It is desired to give test simultaneously on the height of single or several sparsely distributed non-spherical particles. We aim at offering a method to measure the height of minute particles. We also introduce a system of measuring small particle′s height on the basis of microscopic projection and successfully measure single randomly shaped minute particle with height around 100 μm.