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    Journals >Chinese Journal of Lasers >Volume 44 >Issue 9 >Page 905002 > Article
    • Chinese Journal of Lasers
    • Vol. 44, Issue 9, 905002 (2017)
    Design of Spot Size and Optical Path in Scanning Beam Interference Lithography System
    Wang Wei1、2、*, Jiang Shan1, Song Ying1, and Bayanheshig1
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  • 2[in Chinese]
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    DOI: 10.3788/CJL201744.0905002 Cite this Article Set citation alerts
    Wang Wei, Jiang Shan, Song Ying, Bayanheshig. Design of Spot Size and Optical Path in Scanning Beam Interference Lithography System[J]. Chinese Journal of Lasers, 2017, 44(9): 905002 Copy Citation Text show less
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    Article index updated: Jun. 3, 2024
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    Wang Wei, Jiang Shan, Song Ying, Bayanheshig. Design of Spot Size and Optical Path in Scanning Beam Interference Lithography System[J]. Chinese Journal of Lasers, 2017, 44(9): 905002
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