• Acta Optica Sinica
  • Vol. 28, Issue 12, 2431 (2008)
[in Chinese]1、*, [in Chinese]1, [in Chinese]1, [in Chinese]2, [in Chinese]2, [in Chinese]2, and [in Chinese]2
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Design and Fabrication of Al2O3/SiO2 Double-Layer Antireflection Coatings on 4H-SiC Substrate[J]. Acta Optica Sinica, 2008, 28(12): 2431 Copy Citation Text show less
    References

    [1] Feng Yan, Xiaobin Xin, Shahid Aslam et al.. 4H-SiC UV photo detectors with large area and very high specific detectivity[J]. IEEE J. Quant. Electron., 2004, 40(9): 1313~1320

    [2] E. Monroy, F. Omnes, F. Calle. Wide-bandgap semiconductor ultraviolet photodetectors[J]. Semicond. Sci. Technol., 2003, 18(4): R33~R51

    [3] Tan Tianya, Huang Jianbing, Zhan Meiqiong et al.. Design and error analysis of 1064 nm, 532 nm frequency-doubled antireflection coating for LBO[J]. Chin. J. Lasers, 2006, 33(2): 242~247

    [4] Xu Jiangfeng, Chen Qiuling. Anti-reflection coating designed by genetic algorithm[J]. Chin. J. Lasers, 2007, 34(9): 1271~1275

    [5] A. Sciuto, F. Roccaforte, S. Di Franco et al.. Photocurrent gain in 4H-SiC interdigit Schottky UV detectors with a thermally grown oxide layer[J]. Appl. Phys. Lett., 2007, 90(22): Art.No.223570

    [6] Xiaping Chen, Weifeng Yang, Zhengyun Wu. Visible blind p-i-n ultraviolet photodetector fabricated on 4H-SiC[J]. Microelectron. Engng., 2006, 83(1): 104~106

    [7] F. Zhang, H. Zhu, W. Yang et al.. Al2O3/SiO2 films prepared by electron-beam evaporation as UV antireflection coatings on 4H-SiC[J]. Appl. Surf. Sci., 2008, 254(10): 3045~3048

    [8] K. Zhu, D. Johnstone, J. Leach et al.. High power photoconductive switches of 4H SiC with Si3N4 passivation and n+-GaN subcontact[J]. Superlattices Microstruct., 2007, 41(4): 264~270

    [9] Jun Hu, Xiaobin Xin, Jian H. Zhao et al.. Highly sensitive visible-blind extreme ultraviolet Ni/4H-SiC Schottky photodiodes with large detection area[J]. Opt. Lett., 2006, 31(11): 1591~1593

    [10] Avice M, Grossner U, Pintilie I et al.. Comparison of near-interface traps in Al2O3/4H-SiC and Al2O3/SiO2/4H-SiC structures[J]. Appl. Phys. Lett., 2006, 89(22): Art.No.222103

    [11] A. Paskaleva, R. R. Ciechonski, M. Syvajarvi et al.. Electrical behavior of 4H-SiC metal-oxide-semiconductor structures with Al2O3 as gate dielectric[J]. J. Appl. Phys., 2005, 97(12): 124507-1~124507-5

    [12] J. T. Cox, G. Hass, R. F. Rowntree. Two-layer anti-reflection coatings for glass in the near infra-red[J]. Vacuum, 1954, Ⅳ(4): 445~455

    [13] Yuan Jingmei, Tang Zhaosheng, Qi Hongji et al.. Analysis of optical property for several ultraviolet thin film materials[J]. Acta Optica Sinica, 2003, 23(8): 984~988

    [14] K. S. Shamala, L. C. S. Murthy, K. Narasimha Rao. Studies on optical and dielectric properties of Al2O3 thin films prepared by electron beam evaporation and spray pyrolysis method[J]. Mat. Sci. Eng. B-Solid, 2004, 106(3): 264~294

    [15] Tony Huen. Reflectance of thinly oxidized silicon at normal incidence[J]. Appl. Opt., 1979, 18(12): 1927~1932

    [16] Michael E. Levinshtein, Sergey L. Rumyantsev, Michael S. Shur. Properties of Advanced Semiconductor Materials[M]. Yang Shuren, Yin Jingzhi transl., Beijing: Chemical Industry Press, 2003. 169~170

    [17] Tan Tianya, Huang Jianbing, Zhan Meiqiong et al.. Design of 1064 nm, 532 nm, 355 nm frequency-tripled antireflection coating for LBO[J]. Acta Optica Sinica, 2007, 27(7): 1327~1332

    [18] R. Thielsch, A. Gatto, J. Heber et al.. A comparative study of the UV optical and structural properties of SiO2, Al2O3 and HfO2 single layers deposited by reactive evaporation, ion-assisted deposition and plasma ion-assisted deposition[J]. Thin Solid Films, 2002, 410(1~2): 86~93

    CLP Journals

    [1] Zang Yuan, Cao Lin, Li Lianbi, Lin Tao, Fei Yang. Theoretical Study of Electrical and Optical Properties of Ge-Doped 6H-SiC[J]. Laser & Optoelectronics Progress, 2015, 52(6): 61607

    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Design and Fabrication of Al2O3/SiO2 Double-Layer Antireflection Coatings on 4H-SiC Substrate[J]. Acta Optica Sinica, 2008, 28(12): 2431
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