Yishuai HAN, Tianyu SUN, Huimin JIA, Jilong TANG, Dan FANG, Dengkui WANG, Xiaohua WANG, Baoshun ZHANG, Zhipeng WEI. Critical Coupling Condition and Preparation Technology of Aluminum Nitride Microring Resonator[J]. Acta Photonica Sinica, 2021, 50(5): 86
- Acta Photonica Sinica
- Vol. 50, Issue 5, 86 (2021)
Fig. 1. Microring characteristics map
Fig. 2. Relationship between coupling strength and phase mismatch
Fig. 3. Bend-coupled microring resonator
Fig. 4. XRD test chart of AlN single crystal film
Fig. 5. Flow chart of preparation of microring structure
Fig. 6. Pattern distortion caused by electron beam lithography of insulating substrate material
Fig. 7. The effect of electron beam lithography in the coupling area of two conductive layers
Fig. 8. SEM image of four groups of etching results with different parameters
Fig. 9. SEM image of bending coupling microring
|
Table 1. Etching parameters of AlN
Set citation alerts for the article
Please enter your email address
© Copyright 2018-2021 | Chinese Laser Press. All Rights Reserved 沪ICP备15018463号-20