• Acta Optica Sinica
  • Vol. 25, Issue 3, 392 (2005)
[in Chinese]*, [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Fabrication of a Diffractive Image Lithographic System for Optical Storage[J]. Acta Optica Sinica, 2005, 25(3): 392 Copy Citation Text show less
    References

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    [2] John Drinkwater, Zbynek Ryzi, Chris Outwater. A new flexible origination technology based on electron beam lithography and its integration into security devices in combination with covert features based on DNA authentication[J]. Proc. SPIE, 2002, 4677: 203~214

    [3] J. E. Bullema, A. H. van Krieken, M. van den Hurk et al.. Direct write method to create DOVIDs in metal surfaces[J]. Proc. SPIE, 2002, 4677: 175~181

    [4] Xiaodi Tan, Osamu Matoba, Tsutomu Shimura et al.. Secure optical storage that uses fully phase encryption[J]. Appl. Opt., 2000, 39(35): 6689~6694

    [5] Jose Ramon Salgueiro, Juan Felix Roman, Vicente Moreno. System for laser writing to lithograph masks for integrated optics[J]. Opt. Engng., 1998, 37(4): 1115~1123

    [6] L. Luciani, M. Casini. Multiple level technique for high resolution OVDs fabrication[C]. Proc. SPIE, 2000, 3956: 298~304

    [7] Sheng-Lih Yeh, Shyh-Tsong Lin, Dot-matrix hologram with hidden image[J]. Opt. Engng., 2002, 41(2): 314~318

    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Fabrication of a Diffractive Image Lithographic System for Optical Storage[J]. Acta Optica Sinica, 2005, 25(3): 392
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