A New PCB Digital Lithograph Projection Imaging Technology

Liu Zhitao; Zhou Jinyun; Liu Lixia; Guo Hua; Kuang Jian

doi:10.3788/lop52.042203

[1] Jain, Dunn T J, Black P P. High-speed,high-resolution large-area exposure system for PCB patterning [J]. Printed Circuit Fabrication, 1997, 20(5): 34-36.

[2] Jain K, Zemel M, Klosner M. Large- area high- resolution lithography and photoablation systems for microelectronics and optoelectronics fabrication [J]. Proceedings of the IEEE, 2002, 90(10): 1681-1688.

[3] Ran Zuo, Zhou Jinyun, Lei Liang, et al.. A new zooming method for projection imaging lithography [J]. Journal of Applied Optics, 2013, 34(3): 430-435.

[4] Li Wenjing, Zhou Jinyun, Lin Qinghua. Design of fold laser projection lithography lens [J]. Opto- Electronic Engineering, 2007, 34(9): 46-49.

[5] Deng Yafei, Zhou Jinyun, Lei Liang, et al.. Novel projection lens design for large-area PCB lithography [J]. Opto-Electronic Engineering, 2013, 42(2): 100-104.

[6] Cai Yanmin, Wang Xiangzhao, Huang Huijie. Optical design of lithography projective lens with variable total track [J]. Chinese J Lasers, 2014, 41(4): 0416003.

[7] Yao Yuan, Wang Dejiang, Xu Zhengping, et al.. Design of target simulator based on DMD for infrared imaging guided system [J]. Laser& Optoelectronics Progress, 2013, 50(7): 072302.

[8] Wang Zhanliang, Hang Yongan, Qian Xiaofan, et al.. The research of real- time observation of temperature field by using digital holography and DMD [J]. Laser Journal, 2009, 30(6): 36-38.

[9] Li Dan, Xue Yunyun, Cao Wen, et al.. Optimization of DMD illumination system with microlens array [J]. Acta Optica Sinica, 2013, 33(1): 0122002.

[10] Mei W. Point Array Maskless Lithography: US, 6473237B2 [P]. 2002-10-29.

[11] Chan K F, Feng Z, Yang R, et al.. High- resolution maskless lithography [J]. Journal of Micro/Nanolithography, MEMS, and MOEMS, 2003, 2(4): 331-339.

[12] Xu Zhengping. Application of digital micromirror device in photoelectric equipment [J]. Laser & Optoelectronics Progress, 2014, 51(5): 051103.

[13] Guo Xiaowei, Du Jinglei, Chen Mingyong, et al.. Removal of pixel structures by optimizing the parameters of imaging system in digital photolithography [J]. Acta Photonica Sinica, 2007, 36(3): 462-466.